Knoll, D.M.; Hu, Y.; Hassan, Z.; Nieger, M.; Bräse, S.
Planar Chiral [2.2]Paracyclophane-Based Bisoxazoline Ligands and Their Applications in Cu-Mediated N–H Insertion Reaction. Molecules 2019, 24, 4122.
https://doi.org/10.3390/molecules24224122
AMA Style
Knoll DM, Hu Y, Hassan Z, Nieger M, Bräse S.
Planar Chiral [2.2]Paracyclophane-Based Bisoxazoline Ligands and Their Applications in Cu-Mediated N–H Insertion Reaction. Molecules. 2019; 24(22):4122.
https://doi.org/10.3390/molecules24224122
Chicago/Turabian Style
Knoll, Daniel M., Yuling Hu, Zahid Hassan, Martin Nieger, and Stefan Bräse.
2019. "Planar Chiral [2.2]Paracyclophane-Based Bisoxazoline Ligands and Their Applications in Cu-Mediated N–H Insertion Reaction" Molecules 24, no. 22: 4122.
https://doi.org/10.3390/molecules24224122
APA Style
Knoll, D. M., Hu, Y., Hassan, Z., Nieger, M., & Bräse, S.
(2019). Planar Chiral [2.2]Paracyclophane-Based Bisoxazoline Ligands and Their Applications in Cu-Mediated N–H Insertion Reaction. Molecules, 24(22), 4122.
https://doi.org/10.3390/molecules24224122