Swatowska, B.; Powroźnik, W.; Czternastek, H.; Lewińska, G.; Stapiński, T.; Pietruszka, R.; Witkowski, B.S.; Godlewski, M.
Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method. Energies 2021, 14, 6271.
https://doi.org/10.3390/en14196271
AMA Style
Swatowska B, Powroźnik W, Czternastek H, Lewińska G, Stapiński T, Pietruszka R, Witkowski BS, Godlewski M.
Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method. Energies. 2021; 14(19):6271.
https://doi.org/10.3390/en14196271
Chicago/Turabian Style
Swatowska, Barbara, Wiesław Powroźnik, Halina Czternastek, Gabriela Lewińska, Tomasz Stapiński, Rafał Pietruszka, Bartłomiej S. Witkowski, and Marek Godlewski.
2021. "Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method" Energies 14, no. 19: 6271.
https://doi.org/10.3390/en14196271
APA Style
Swatowska, B., Powroźnik, W., Czternastek, H., Lewińska, G., Stapiński, T., Pietruszka, R., Witkowski, B. S., & Godlewski, M.
(2021). Application Properties of ZnO and AZO Thin Films Obtained by the ALD Method. Energies, 14(19), 6271.
https://doi.org/10.3390/en14196271