5.1. Microstructures
OHC1: In the top and bulk of OHC1-AC the T ((TM)
6Si
5), τ
1 (FeSi
2Ti) and (Fe,Cr,Ti)Si compounds were observed. The latter two were formed in-between the T phase dendrites, but it was not clear whether the τ
1 (FeSi
2Ti) was surrounded by the (Fe,Cr,Ti)Si, which would be consistent with a peritectic reaction, or formed lamellae next to the (Fe,Cr,Ti)Si, which would be consistent with the eutectic L → τ
1 (FeSi
2Ti) + (Fe,Cr,Ti)Si that was observed in the bottom and chill zone of the button (
Figure 3b,c).
A peritectic reaction would explain some of the microstructures shown in the
Figure 3a but not the peritectic reaction L + τ
1 (FeSi
2Ti) → FeSi + τ
4 (Fe
28.1Ti
26.3Si
45.6) suggested by Weitzer et al. [
39] because the presence of the τ
4 (Fe
28.1Ti
26.3Si
45.6) was not confirmed by XRD. Some of the analyses that were designated to the T phase corresponded to the composition of the τ
4 phase. It could be argued that, owing to the partitioning of solutes, some τ
4 was actually present near the (Fe,Cr,Ti)Si. However, if the aforementioned peritectic reaction had occurred one would expect it to move towards completion upon heat treatment, which means that the size and volume fraction of the τ
1 (FeSi
2Ti) would decrease and the size and volume fraction of (Fe,Cr,Ti)Si would increase after the heat treatment. Exactly the opposite was observed.
In the Cr-Ti-Si system [
40] the T phase is stable below 1565 °C and in the Fe-Ti-Si system [
39] the τ
1 (FeSi
2Ti) is stable below 1532 °C and the FeSi below 1328 °C. Alloying the latter with Cr would be expected to increase only slightly the above temperature. The alloying with Ti would not raise the melting temperature of (Fe,Cr,Ti)Si above 1532 °C (in the Si rich region of the Fe-Ti-Si system the TiSi is stable below 1450 °C).
The formation of the T phase was accompanied by the partitioning of Fe and Cr, Nb and Ti. Iron was rejected into the melt, while the other elements partitioned in the solid, see
Figure 2. Thus, as the T phase was formed the surrounding melt became richer in Fe and leaner in Cr, Nb and Ti. The τ
1 (FeSi
2Ti) + (Fe,Cr,Ti)Si eutectic that was formed in-between T phase dendrites was richer in Fe and lean in Nb, Ti and Cr compared with the alloy composition.
The formation sequence, in terms of decreasing temperature, of the intermetallic phases in OHC1-AC should be T, then τ
1 (FeSi
2Ti) and finally (Fe,Cr,Ti)Si. It is suggested that the solidification path was L → L + T → T + {τ
1 + (Fe,Cr,Ti)Si}
eutectic with a very small volume fraction of τ
1 in the top and bulk of the button owing to the composition of the inter-dendritic melt relative to the eutectic composition. According to the data in [
39], the solubility range of τ
1 (FeSi
2Ti) is very narrow, which could be another reason for its difficulty to form in the top and bulk of OHC1-AC. Indeed, the composition of this phase moved closer to the one reported by Weitzer et al. [
39] after the heat treatment, owing to the partitioning of solutes in the microstructure.
In the areas near to the bottom and the chill zone of the button, the solidification path was essentially the same as described above but because the melt was richer in Fe and leaner in Cr, Nb and Ti (owing to the macrosegregation in OHC1-AC) the inter-dendritic melt was closer to the eutectic composition and thus the volume fraction of the eutectic was higher in these areas of the button.
In the T phase the partitioning of Ti and Cr was opposite to that of Fe (
Figure 2), for the former two elements the partitioning coefficient k
oTM (TM = Cr, Ti) was greater than one and for Fe it was less than one. Use of the Scheil equation and the concentration profiles of Fe, Cr and Ti in
Figure 2 gave k
oFe = 0.522, k
oCr = 1.482 and k
oTi = 1.267. The Ti concentration in (Fe,Cr,Ti)Si was in agreement with Weitzer et al. [
39] who reported that the solubility of Ti in FeSi is about 1 at%.
OHC5: In this alloy there was macrosegregation of Al, Cr, Nb, Si and Ti with different profiles of Nb and Si compared with Al, Cr and Ti, and also there was microsegregation, particularly in the (Cr,Ti,Nb)(Si,Al)
2 and (Cr,Ti,Nb)
6Si
5 compounds. The (Nb,Ti)(Si,Al)
2 was formed at the highest volume fraction and the other intermetallics and solid solutions formed from the liquid between the (Nb,Ti)(Si,Al)
2 grains. Considering the crystal structures of the binary disilicides NbSi
2, CrSi
2 and TiSi
2 (see
Section 2), the former two could form a continuous solution phase. Nakano et al. [
44] suggested that very small substitutions of Nb and Si by Ti and Al in NbSi
2 (with up to 1.7 at.% Ti substituting Nb and up to 2 at.% Al substituting Si) would stabilize the C54 crystal structure. This was not confirmed by our results. Indeed, the TiSi
2 was not detected in OHC5-AC and OHC5-HT by EDS and XRD. However, the CrSi
2 was confirmed by XRD (
Figure 1) and its Nb, Ti and Al contents were up to 6 at.%, 12.3 at.% and 10 at.%, respectively. The solubility of these elements in the CrSi
2 based (Cr,Ti,Nb)(Si,Al)
2 was in agreement with the solubilities reported in the Ti-Cr-Si and Cr-Si-Al ternary systems [
40,
45].
The ranking of the unalloyed disilicides according to their melting temperatures is T
mNbSi2 = 1935 °C, T
mTiSi2 = 1480 °C and T
mCrSi2 = 1450 °C [
19]. The melting temperature of (TM)
6Si
5 is higher than 1500 °C (see above). Thus, it would be expected that the primary phase to form from the melt was the intermetallic based on NbSi
2, namely the (Nb,Ti)(Si,Al)
2 followed by the (TM)
6Si
5 and then the (Cr,Ti,Nb)(Si,Al)
2 and finally the solid solutions of Si and Al. The primary (Nb,Ti)(Si,Al)
2 phase formation is supported by the Nb-Cr-Si liquidus projection [
46] when the alloy is considered as Cr-(Nb,Ti)-(Si,Al). The formation of the (TM)
6Si
5 after the aforementioned primary phase is also in agreement with the liquidus projection. Thus, the solidification path of the alloy OHC5-AC was L →L + (Nb,Ti)(Si,Al)
2 →L + (Nb,Ti)(Si,Al)
2 + (TM)
6Si
5 → L + (Nb,Ti)(Si,Al)
2 + (TM)
6Si
5 + (Cr,Ti,Nb)(Si,Al)
2 → (Nb,Ti)(Si,Al)
2 + (TM)
6Si
5 + (Cr,Ti,Nb)(Si,Al)
2 + (Si)
ss or (Al)
ss (depending on the solidification conditions and the composition of the last to solidify melt).
After the heat treatment the (Cr,Ti,Nb)(Si,Al)
2 and the (Al)
ss and (Si)
ss were not stable and the Cr concentration in the TM
6Si
5 silicide had increased significantly. The former is in agreement with the 1500 °C isothermal section of Cr-Nb-Si [
46] when the heat treated alloy is considered as Cr-(Nb,Ti)-(Si,Al) and the latter is attributed to the dissolution of the (Cr,Ti,Nb)(Si,Al)
2.
5.2. Oxidation
OHC1-800 °C: The alloy did not pest. The scale was composed of SiO
2, TiO
2 and (Cr,Fe)
2O
3. In the substrate below the scale α-Fe, τ
3 (Fe
40Si
31Ti
13) and Fe
5Si
3 were formed owing to the depletion of the elements that formed the oxides in the scale. The location of the oxides in the scale was linked with the underlying phases in the substrate. The microsegregation in the (TM)
6Si
5 (
Figure 2) affected its oxidation. On top of the (TM)
6Si
5 grains the scale was composed of fine granular particles of TiO
2 engulfed by SiO
2. The TiO
2 contained other elements that were in solution in the (TM)
6Si
5 (
Figure 10); the Cr and Nb concentrations were higher in the centre of the grains and gave the rutile type structure (Ti,Cr,Nb)O
2 oxide while over the Fe-rich edges of the (TM)
6Si
5 no Fe was observed in the oxide owing to the low solubility of Fe in the TiO
2. The low solubilities of Fe and Cr in TiO
2, respectively about 1 at.% and 4 at.% [
47,
48], and the fact that Fe can be transported through SiO
2 towards the surface of the scale [
49] suggested that some (Cr,Fe)
2O
3 + TiO
2 could have formed on top of the Fe-rich areas of the (TM)
6Si
5 compound.
The same oxidation behaviour was observed along (TM)6Si5 dendrites but in this case the TiO2 particles were coarser. The EDS analysis of cross sections of the interface of (TM)6Si5 with the scale showed a depletion of about 3.5 at.% Si and 2.5 at.% Ti at the substrate/scale interface. Considering the above, and the fact that the volume fraction of (TM)6Si5 was the highest in the alloy, GXRD was performed at different angles to search for other phases. None was found.
The X-ray maps (
Figure 10) showed Si, Fe and O over the (Fe,Cr,Ti)Si compound. Fe-Si alloys form a sequence of oxide layers depending on their Si content. At low Si concentrations FeO forms next to the bare metal, and engulfs a dispersion of Fe
2SiO
4 particles, then follows a layer of Fe
3O
4, and finally a layer of Fe
2O
3 is formed as the outermost layer. Some internal oxidation of Si has been observed in these alloys [
50]. A reduction in the volume fraction of Fe oxides was found in the scale formed on Fe-Si alloys with high Si content in which an inner layer of SiO
2 and an outer layer of Fe
2O
3 were observed [
49]. Considering the high Si content of the (Fe,Cr,Ti)Si phase, the latter would be expected to form an inner SiO
2 layer and Fe
2O
3 as the top oxide at 800 °C. It is suggested that these two oxides were formed over the (Fe,Cr,Ti)Si phase since they were confirmed by GXRD (
Figure 9a) and Fe, Si and O were present over the (Fe,Cr,Ti)Si phase in the X-ray maps (
Figure 10). The EDS analyses revealed that there was mainly Si depletion from the (Fe,Cr,Ti)Si phase that caused the formation of consecutive layers of Fe
5Si
3 and α-Fe underneath the scale. The Si depletion was the result of the formation of the SiO
2 layer. The α-Fe was found at the substrate/scale interface with Si and Cr contents, respectively 17.3 at.% and 3.7 at.%. According to Adachi and Meier [
49], this Si concentration is enough to form a continuous SiO
2 film over this phase. However, they also found some Fe
2O
3 at the scale/gas interface that was attributed to Fe transport through the SiO
2 layer to form Fe
2O
3. It is likely that a thin film of (Fe,Cr)
2O
3 formed on top of the SiO
2 that formed on the (Fe,Cr,Ti)Si phase.
The X-ray maps (
Figure 10) showed that on the FeSi
2Ti phase mainly formed coarse grains of TiO
2. This is in agreement with the depletion of Ti and Si near the substrate/scale interface and the formation of the τ
3 (Fe
40Si
31Ti
13) and α-Fe below the scale. The τ
3 phase was not detected by the GXRD for all the studied glancing angles because the volume fraction of the FeSi
2Ti phase in the alloy was the lowest.
A comparison of our results with the oxidation of Si-rich Ti containing silicides is reasonable since on the FeSi
2Ti phase only TiO
2 and SiO
2 formed. According to Kofstad [
41], the Ti oxidizes more rapidly than Si, thus it is possible that at 800 °C the mobility of metal ions to the surface of this phase was higher that the mobility of Si and this caused the formation of coarse granular TiO
2 engulfed by a glassy-like SiO
2 network, see
Figure 10. The EDS spectrum (not shown) for point 3 in
Figure 10 showed the analysis to be rich in Ti, Si, O and N. In the GXRD diffractograms no nitride peaks were found. However, it is possible that in the earliest stage of oxidation both Ti nitride and TiO
2 formed, and the N was then released and reacted again with the silicide or trapped under the scale [
51,
52]. This could explain the formation of pores and cavities beneath and across the scale (
Figure 11). The high Fe content of the complex silicides could have increased the mobility of Ti to the surface because coarse grains of TiO
2 were observed on top of the FeSi
2Ti phase and the same was observed near the grain boundaries of the (TM)
6Si
5 phase, where the Fe content was the highest (
Figure 10).
There was some oxidation of the sample before the isothermal oxidation temperature was reached. Some uneven reddish mark was observed on the crucible. It is likely that Fe oxides had reacted with the alumina crucible. The Fe2O3 has a red colour and the XRD data confirmed the presence of this oxide in the scale. It is unlikely that the reaction with the alumina crucible contributed to the isothermal oxidation because the initial staining on the crucible did not change with time.
The oxidation data (
Figure 7) showed a parabolic weight gain in the first ten hours (
Table 1). This may be attributed to the formation of SiO
2 for which oxidation rates about 10
−13 g
−2cm
−4s
−1 at 800 °C and about 10
−12 g
−2cm
−4s
−1 at 950 °C have been reported. The predominant oxidation behaviour was linear after the first 10 h. It is not clear why this was the case, as no oxide spallation was observed, and evaporation of CrO
3 (in dry conditions) is not expected at this temperature. No significant Cr depletion at the substrate/scale interface was found and there was no extensive Cr
2O
3 formation in the scale. It is possible, however, that time-dependent structural changes occurred in the scale that resulted in a linear rate even though diffusion controlled the oxidation. The oxidation of Ti above 700 °C first follows parabolic kinetics (due to oxygen dissolution in the base metal) then changes to linear (after TiO
0.35 forms as an outer layer where O diffusion is faster) due to a change in the diffusion controlling oxidation mechanism [
53]. Moreover, in the temperature range 800–1000 °C, the growth of TiO
2 scales is characterised by the diffusion of Ti in the inner layer and by the diffusion of oxygen in the outer layer, which creates stress and cracks. TiO
2 formed at a high volume fraction in the scale, thus it is suggested those changes in the oxidation behaviour of Ti could have had strong influence in the overall oxidation of the alloy.
The coarsening of oxides in the scale could also have been a factor that had an effect on the oxidation behaviour of this alloy. The growth of different oxides of different volumes would give rise to internal stresses and strains in the scale. The strain was released by cracking the scale, thus exposing the substrate to further oxidation. Besides, the depletion of some elements in the alloy near the scale/substrate interface due to oxidation could lead to a phase transformation in these regions, increasing the mismatch at the interphase interfaces, and resulting in strains that changed the adhesion of the scale at the scale/substrate interface.
OHC5-800 °C: The alloy did not pest, instead it followed parabolic oxidation kinetics with n = 0.54 (
Table 1) and formed a very thin adherent scale that mainly consisted of Al
2O
3. The EDS and GXRD suggested that SiO
2 and rutile type oxides (Ti
(1−x−y),Cr
x,Nb
y)O
2 were also present in the scale. These did not appear to be detrimental to the oxidation resistance of the alloy. Oxides with different morphology and composition (
Figure 13 and
Figure 14) formed in the scale, which would suggest that it is likely that the oxidation of phase(s) was influenced by their chemical inhomogeneity.
The phases that were present in the alloy oxidised differently forming a scale of uneven thickness (1–4 μm),
Figure 15. The thinner scale was formed on the (Cr,Nb,Ti)
6Si
5. The thickness of the scale formed on the (Nb,Ti)(Si,Al)
2 depended on its Al content, was thinner in those areas where the Al content was above 3 at. % while in the areas with a low Al content (less than 3 at.%) an IOZ formed. In this context not only the scale thickness was affected by the Al content in the (Nb,Ti)(Si,Al)
2 but also the oxidation mechanism since the development of a different microstructure in the scale was seen (
Figure 15). It is highly likely that the local composition of this phase dramatically affected its oxidation. Chemical analyses showed that in areas of Al lean (Nb,Ti)(Si,Al)
2, the scale consisted of an external layer of transient complex oxides which might not be protective. Thus, Al was possibly internally oxidised until a continuous Al
2O
3 layer formed below the IOZ hindering further oxidation. According to Meier and Petit [
54], alloys with low solute contents oxidise by inner diffusion of oxygen. On the other hand, near the (Nb,Ti)(Si,Al)
2 grain boundaries (Al-rich areas) the activity of Al and Si was higher and a scale formed that consisted of an outer layer (transient oxides) mainly composed of Al and Si and an inner layer very rich in Al. The ridges (lumps) at the substrate/scale interface were related to the (Cr,Ti,Nb)(Si,Al)
2 phase but it is not clear if they had formed as a result of the substrate recession presented by the (Nb,Ti)(Si,Al)
2 phase (internally oxidised), or by coarsening caused by the loss of Al and Cr from the (Nb,Ti)(Si,Al)
2 phase or by both phenomena.
Thus, considering the microstructure of the scale, it is suggested that the oxidation of (Nb,Ti)(Si,Al)2 depended on the availability of Al with about 3 at.% Al possibly being the critical content (in the presence of Ti and Cr). Aluminium contents below the critical one would promote a faster inward diffusion of oxygen oxidising Al preferentially inside the phase. This mechanism is consistent with a parabolic behaviour. Above 3 at.% Al, the (Nb,Ti)(Si,Al)2 would form an external oxide. The X-ray elemental maps showed Al, O, Nb and Si as the main components of the scale.
It was expected to find Nb and Si oxides from the oxidation of the (Nb,Ti)(Si,Al)
2 phase, as it was observed by Zhang et al. [
55] and Murakami et al. [
56]. The data from our work suggests that the scale formed on this phase was mainly composed of Al
2O
3 and that Si and Nb presented a minor contribution but with the same 1:2 ratio as in the NbSi
2 phase, which suggests that their oxidation in those areas is unlikely to have occurred. Thus, it is proposed that the internal oxidation started from an initial oxidation of all the components where complex rutile oxides with different compositions formed along with SiO
2 and Al
2O
3, the rutile type oxides could have served as a pathway allowing the inward diffusion of oxygen that reacted with Al (not being sufficient to establish a continuous Al
2O
3 layer). The scale/substrate interface receded up to an Al
2O
3 compact layer that was established below the IOZ. The increase of the oxidation rate could be related to a rapid Al transport through the scale. According to Prescott and Graham [
57] θ-Al
2O
3 presents a faster Al transport. However, preferential orientation could also influence the Al diffusion towards the substrate/scale interface.
The thickness of the scale formed on top of the (Nb,Ti)(Si,Al)
2 compound was dependent on the Cr concentration, as the latter affects the Al activity. It is known that the addition of Cr reduces the concentration of Al required to grow and sustain an alumina scale in Ni-Cr-Al and Fe-Cr-Al alloys during oxidation. Previous studies have shown that a mixed oxide composed by SiO
2 and Nb
2O
5 formed at 750 °C when 8 at.% Cr was added to NbSi
2, while the addition of 20 at.% Cr improved the oxidation behaviour via the formation of a scale composed by an inner layer of SiO
2 and an outer layer of Cr
2O
3. The underlying substrate alloy was depleted in Cr [
58]. According to Murakami et al. [
59], a thin SiO
2 layer was formed on Nb-66.7Si alloys with 10 at.%, 20 at.%, 33.3 at.% Cr additions after oxidation in flowing air at 750 °C. Al additions may not have a beneficial effect on the oxidation of NbSi
2 at low temperature. The Nb-56Si-11Al alloy exhibited scale spallation when it was exposed to dry air at 750 °C [
56]. The alloys Nb-56Si-11Al-3Cr (Cr-doped alloy) and Nb-48Si-19Al-29Cr (Cr-rich alloy) showed very good oxidation resistance at low temperature but the Cr doped alloy had very good oxidation resistance in the range of 500 °C to 1400 °C, and the Cr-rich alloy had very poor oxidation resistance at high temperatures [
56].
Based on the microstructure observed in the scale/substrate interface, it is suggested that the (Cr,Ti,Nb)(Si,Al)2 compound presented higher Al and Si activities that made possible the formation of an outer SiO2 +Al2O3 scale, and an inner layer of Al2O3.
The EDS analysis of the oxidation products of the (Nb,Cr,Ti)
6Si
5 phase was limited owing to the very thin scale that formed on top of this phase. Images of the scale surface suggested that the oxidation products were complex rutile type oxides, SiO
2 and some Al
2O
3. EDS analyses of the (Nb,Ti)(Si,Al)
2 at the substrate/scale interface did not reveal elemental depletion, especially of Al, which was actually slightly enriched at the substrate/scale interface. Murakami et al. [
59] observed a similar behaviour in the alloy Nb-47Si-20Al with the Nb
3Si
5Al
2 phase as the matrix. The (Cr,Ti,Nb)(Si,Al)
2 compound presented some Al depletion of about 50% less of the initial Al content. There is no data to compare with the (Nb,Cr,Ti)
6Si
5 phase.
The α-Al
2O
3 is not expected to form at 800 °C. However, the GXRD indicated its presence. The EDS analyses of the scale showed that there were two microstructures in the areas that were Al and O rich, one consisting of spherical clusters of angular particles which were mostly located in the Al rich areas of the alloy, and ridge networks that spread over the Al-rich areas of the (Nb,Ti)(Si,Al)
2 phase. According to Brumm and Grabke [
43], the ridge network microstructure is related to the transformation of θ-Al
2O
3 to α-Al
2O
3. If this transformation had occurred, the oxidation rate should have decreased. Instead it increased, which suggests that another contribution to the formation of less protective oxides influenced the slight increase of the oxidation rate. Thus, the above could suggest that Cr promoted a faster stabilization of α-Al
2O
3 at the scale/substrate interface, while at the scale/gas interface θ-Al
2O
3 whiskers were formed. Cr promotes the transformation of θ-Al
2O
3 to α-Al
2O
3 [
43]. The oxide surface formed over some Al-rich areas in the alloy presented a network-like structure Al
2O
3 that extended over the scale of (Nb,Ti)(Si,Al)
2, which suggests a lateral growth that had resulted from the transformation of θ-Al
2O
3 to α-Al
2O
3.
The oxidation of the alloy OHC5 was different from those of Nb-Si-Al based alloys reported in the literature. Although the Nb-Al-Si-Cr alloys studied by Murakami et al. [
59] did not suffer from pest oxidation at 750 °C and followed parabolic oxidation, they did not form Al
2O
3 at low temperature, instead mixed oxides of all the components were formed. This would suggest that the presence of Ti in the alloy OHC5 was beneficial for the establishment of an Al
2O
3 oxide scale on top of the (Nb,Ti)(Si,Al)
2 and (Cr,Ti,Nb)(Si,Al)
2 phases, and that the rutile type oxides were not detrimental at 800 °C.
OHC1-1200 °C: The alloy showed para-linear oxidation kinetics (
Table 1). According to the EDS and GXRD data, the scale was composed of the Cr
2O
3, SiO
2 and TiO
2 oxides. The Cr
2O
3 was the predominant oxide in the scale. The composition of this oxide was affected by the composition of the (TM)
6Si
5 phase and its different Ti, Fe and Cr contents (
Figure 2). The Fe
2O
3 and Cr
2O
3 oxides with rhombohedral crystal structure show a continuous series of solid solutions in the Fe-Cr-O ternary system. The Fe
2O
3, Cr
2O
3 and Ti
2O
3 are isostructural, thus it is not surprising to find different ranges of solubility according to the availability of Fe, Cr and Ti in the (TM)
6Si
5. The oxidation of the complex silicide (Ti,Fe,Cr)
7Si
6 was reported by Portebois et al. [
60]. Its oxidation products were similar to those formed on the (TM)
6Si
5 in OHC1 at 1200 °C except for the formation of Cr
2TiO
5 which seems not to be in equilibrium with Cr
2O
3 below 1660 °C [
61].
According to Kosftad [
62], during the growth of Cr
2O
3 internal strains arise in the scale as a result of oxygen and Cr transport through the scale with the Cr diffusion being much faster than that of the O. The Cr
2O
3 layer presented a granular morphology. It is likely that grain boundaries allowed the transport of oxygen further in the alloy to oxidize the FeSi
2Ti and form SiO
2 and some TiO
2 at this temperature. This would explain why the SiO
2 was mainly found below the Cr
2O
3. Some areas of the scale were still in contact with the Cr
2O
3 layer. The protectiveness of the scale formed on the alloy OHC1 would rely on the establishment of a more continuous SiO
2 layer underneath the Cr
2O
3 that could act as a barrier for further metal and oxygen transport.
The thickness of the scale was in the range 10 to 30 μm. The Cr
2O
3 was mostly found in the outermost layer, and the SiO
2 in the inner part of the scale. The distribution of these oxides in the scale was irregular and was the reason for the variation in thickness. The scale was adherent, but could not be considered as protective. Cr
2O
3 in the scale has been linked with para-linear oxidation at high temperatures [
50].
The insert number 1 in the
Figure 18 shows coarse and fine grains of Cr
2O
3 in the top of the scale where the oxygen partial pressure was higher than at the scale/substrate interface. The para-linear behaviour is attributed to the fact that Cr
2O
3 can be further oxidised at high oxygen pressures and high temperatures to form CrO
3, which is volatile at 1200 °C. It is likely that the mixture of coarse and fine grained Cr
2O
3 in the scale was the result of the reaction Cr
2O
3 (s) + 3/2 O
2 (g) = 2 CrO
3 (g), which could be responsible for the change in the oxidation of this alloy from parabolic to linear after 40 h at 1200 °C. According to Kofstad [
41], the oxidation of Cr
2O
3 into CrO
3 is enhanced as the thickness of Cr
2O
3 increases. The EDS analyses performed on Cr
2O
3 at different distances from the scale/substrate interface showed some Ti and Fe in solution in this oxide.
The insert number 2 in
Figure 18 shows an oxide with a glassy-like appearance. Qualitative EDS showed that this was SiO
2. These areas were mostly observed on top of the FeSi
2Ti phase in the underlying microstructure. As was the case for the oxidation of this phase at 800 °C, TiO
2 and SiO
2 were its oxidation products. The EDS showed some Ti dissolved in the SiO
2. The GXRD showed peaks that corresponded to TiO
2. Becker et al. [
63] suggested that the solubility of TiO
2 in SiO
2 is increased with temperature. This would be the reason why it was possible to find TiO
2 dissolved in SiO
2 instead of coarse particles of TiO
2 dispersed in a SiO
2 network. Despite the high Fe content of the FeSi
2Ti phase, no Fe oxides were detected. This was attributed to the preferential oxidation of Si and Ti, and is in agreement with Tsirlin et al. [
64]. One of the possible reasons for this behaviour is that the low Fe solubility in TiO
2 allowed a mixture of TiO
2 and SiO
2 to be stabilised at 1200 °C. Indeed, according to Wittke [
47] the solid solubility of Fe in TiO
2 is about 1 at.% in the range of 800 °C to 1200 °C.
Oxide melting could be responsible for the network-like oxide microstructure observed in the insert number 3 in
Figure 18. This feature was observed on the oxide formed on top of the (Fe,Cr,Ti)Si phase. It is suggested that this melting could be the result of the eutectic reaction L → FeO + Cr
2O
3 + SiO
2 at 1155 °C reported by Kainarskii and Degtyareva [
65]. EDS analyses from this area confirmed the presence of Si, Cr and some Fe and thus it is possible that some FeO formed. Its volume fraction could have been low to be detected by GXRD but enough to react with the SiO
2 and Cr
2O
3 that were the dominant oxides.
In the cross sections of the substrate/scale interface voids were observed in the (Fe,Cr,Ti)Si phase and some Cr depletion in the substrate underneath the scale. The solid solutions formed by Fe
2O
3-Cr
2O
3 are converted at high temperatures to the ternary FeO-Fe
2O
3-Cr
2O
3 by the dissociation of Fe
2O
3 [
65]. According to the Fe-Cr-O system, at 1200 °C the FeO dissolves Cr before some spinels are stabilized. Thus, if FeO was formed this could suggest that this phase could transport some Cr towards the oxide surface. There was some Cr in the SiO
2 that formed on top of the (Fe,Cr,Ti)Si phase, which would suggest that there was some Cr transport from the substrate/scale interface towards the oxide/scale surface through the SiO
2 network. The diffusion zone beneath the scale was 30–40 μm thick.
It is likely that the oxidation of this alloy in the first 40 hours at 1200 °C involved the formation of Cr
2O
3 layer along with SiO
2 layer underneath and some evaporation of CrO
3. When the Cr
2O
3 reached a certain thickness the CrO
3 evaporation became more important leading to a change in oxidation from parabolic to linear. There should have also been some contribution to the oxidation kinetics from the other minor oxides that were formed in the scale at this temperature. The overall oxidation could be considered as para-linear even though n = 0.68 (
Table 1). According to Kosftad [
62], para-linear oxidation occurs when a compact and protective scale forms at the scale/gas interface and becomes non-protective owing to the formation of pores caused by oxide evaporation. Then the oxidation kinetics changes from parabolic to linear.
OHC5-1200 °C: The EDS and GXRD data indicated that the scale was composed of α-Al
2O
3, see
Figure 20b, the analysis for number (1) in
Figure 21 and the aluminium and oxygen X-ray maps in
Figure 22. All the phases in the alloy must had contributed to α-Al
2O
3 formation at 1200 °C including the (Nb,Cr,Ti)
6Si
5 that had very low Al solubility.
Figure 7 would suggest that initially some transient oxides might have had also formed.
As it is often observed in alumina scales, the Al
2O
3 scale formed on the alloy OHC5 had uneven thickness, oxide lumps and lace-like ridges. The growth of Al
2O
3 ridges is the result of the transformation of transient alumina(s) to α-Al
2O
3. According to Prescott et al. [
66], the transformation of transient alumina to α-Al
2O
3 starts and grows laterally until grain boundaries meet. The last areas to convert to α-Al
2O
3 are the grain boundaries where ridges form as a result of the outward diffusion of Al ions thickening the oxide formed at the grain boundaries. On the oxide surface there were particles with the same composition but different morphologies, which would suggest that some deformation that resulted from the build-up of compressive stress from the oxide growth had affected the supply of Al and O for the continuous growth of Al
2O
3. Grain orientation and the composition of the oxidised phase may have also contributed to the different morphology presented by the Al
2O
3 particles. The cross sections showed that the scale was continuous and adherent and presented the classical morphology of a α-Al
2O
3 scale with coarsened grains at the substrate/scale interface.