Hegedüs, N.; Balázsi, C.; Kolonits, T.; Olasz, D.; Sáfrán, G.; Serényi, M.; Balázsi, K.
Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions. Materials 2022, 15, 6313.
https://doi.org/10.3390/ma15186313
AMA Style
Hegedüs N, Balázsi C, Kolonits T, Olasz D, Sáfrán G, Serényi M, Balázsi K.
Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions. Materials. 2022; 15(18):6313.
https://doi.org/10.3390/ma15186313
Chicago/Turabian Style
Hegedüs, Nikolett, Csaba Balázsi, Tamás Kolonits, Dániel Olasz, György Sáfrán, Miklós Serényi, and Katalin Balázsi.
2022. "Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions" Materials 15, no. 18: 6313.
https://doi.org/10.3390/ma15186313
APA Style
Hegedüs, N., Balázsi, C., Kolonits, T., Olasz, D., Sáfrán, G., Serényi, M., & Balázsi, K.
(2022). Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions. Materials, 15(18), 6313.
https://doi.org/10.3390/ma15186313
