Capillary Underfill Flow Simulation as a Design Tool for Flow-Optimized Encapsulation in Heterogenous Integration †
Abstract
:1. Introduction
2. Materials and Experimental Methods
2.1. Vertical Integration Packaging Concept
2.2. Test Setup
- To retain a representative material composition, the flow was monitored using thinned FR4 and Al2O3 substrates. For die imitation, a copper layer was attached via solder/sinter preforms. Substrate materials and dimensions are listed in Table 1;
- Test samples for flow calibration without any overhangs within the gap were illuminated from underneath to guarantee high-contrast images;
- To include flow-optimizing design elements, dam underfill was applied before soldering. Benefits of this material include its limited wetting characteristics and its capacity to accommodate fluctuating gap dimensions;
- After setup, the gap height of each specimen was measured using confocal laser scanning microscopy. Considering substrate warping caused by thermal expansion during the joining process, average gap heights were computed with polynomial fitting;
- Translucency of the thinned substrates enabled real-time monitoring of the black-colored underfill, captured from a top view (xy-plane). Accordingly, this approach is well-suited for identifying voids across the entire gap height.
2.3. Material Characterization
2.4. Virtual Mapping: Post-Processing of Flow Recordings
3. Numerical Simulation
3.1. Governing Equations
3.2. Computational Domain and Boundary Conditions
3.3. Implementation of Varying Dispensing Patterns
3.4. Coupling Two-Phase Flow with Heat Transfer
3.5. Grid Convergence Study
3.6. Parametric Optimization of VOF Model
3.6.1. Angle Factor, Blending Criterion, and HRIC Scheme
3.6.2. Interfacial Artificial Viscosity
3.6.3. Implicit Multi-Stepping
4. Experimental and Numerical Results
4.1. VOF Sensitivity Study
4.2. Experimental Verification
- Simplified inlet condition: simulation assumes complete wetting of the gap, whereas several seconds are necessary for adequate material deposition;
- Heat transfer within underfill is neglected: since the underfill was not preheated before application, it undergoes a temperature transition from room temperature to 60 °C, resulting in a lower initial experimental flow velocity;
- Time-dependency of the contact angle : in alignment with time-dependent sessile drop measurements (Figure 2c), the equilibrium contact angle is reached not before 60 s. This dynamic aspect was not considered in the previous model, contributing to temporal discrepancies.
- Figure 16a illustrates a filling scenario of a single IGBT chip with emitter and gate pad being mounted on a ceramic substrate. The model accurately replicated critical flow behavior near the gate interconnection with a low average deviation of only 2.55%. The deep indentation of the sintered joint and the resulting passage around the gate do not allow for void-free filling and inevitably lead to air being trapped between emitter and gate. The simulation has convincingly replicated this behavior.
- In Figure 16b, a common scenario is depicted where the geometric configuration results in irregularly shaped flow fronts, giving rise to uncontrolled merging of multiple free surfaces and, consequently, an increased likelihood of air entrapment. Once again, the simulation showed impressive agreement with the experimental results (2.84% deviation). Minor deviations of the interface primarily resulted from shape deviations and indentations in the joining zones within the experimental setup. Meniscus-shaped solder joints and areas of non-densified, porous sintering material seem to have an impact on the flow along the lateral chip surfaces.
5. Design Studies for Targeted Flow Manipulation
5.1. Flow Speed Adjustment
- Arch-shaped flow barriers decelerate and redirect the flow, tilting the interface orientation towards the outer periphery. This mechanism can also transport unavoidable voids to a less critical peripheral gap area;
- A flat layer (100 µm) was introduced to slow down the flow by reducing the cross-sectional height. Vice versa, to intentionally accelerate the flow, the inclusion of non-functional metallization areas with easily wettable surfaces is an option. Note that any additional layer will reduce gap height, weakening the accelerating effect;
- Higher bump pitch for more manageable flow behavior;
- Stands as a reference flow without any modifications;
- Additional layers for lowering the contact angle are more efficient, if incorporated in a striped shape instead of full coverage. This can be beneficial when substrate depressions are not a viable option to increase the local gap height.
5.2. Gap Compartmentation
5.3. Enforcing Chip-Near Confluence
5.4. Experimental Validation of Design Element Viability
- The results in Figure 20a confirm successful flow control by routing the underfill through the gate channel without air entrapment. Below the semiconductor, the experimental flow propagates slightly faster than the simulation because of non-planarity occurring during assembly. The rise in temperature during soldering triggers the shrinkage of the dam material, leading to substrate tilting, which was not included in the geometry model. Discrepancies between the experiment and the simulation still demonstrate good agreement with only 3.34% deviation.
- Figure 20b highlights the benefit of arcuate valve-like features and confirms, once again, the accuracy of the simulation (2.84% deviation). The numerical as well as the experimental results demonstrated successful void prevention for both fully obstructing and half-height dam elements. Based on this finding, flow control measures do not necessarily need to adopt constricting dam designs. The redirection of flow can also be achieved through partial gap blockage or sharply designed recesses, offering a viable alternative without adverse consequences like substrate tilting or warping.
6. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
Nomenclature
List of symbols: | List of abbreviations: | |||
Dynamic viscosity | AMR | Adaptive Mesh Refinement | ||
Interpolated measurement viscosity data | ATS | Adaptive Time Step model | ||
Fitted power law viscosity | CFD | Computational Fluid Dynamics | ||
Interfacial artificial viscosity | CFL | Courant–Friedrichs–Lewy condition | ||
Fixed initial viscosity for low shear rates | CTE | Coefficient of Thermal Expansion | ||
m | Flow consistency index (power law) | DBC | Direct Bonded Copper | |
n | 1 | Flow behavior index (power law) | DDS | Differential Downwind Scheme |
1/s | Zero shear rate limit of power law definition | DICOM | Digital Imaging and Communications in Medicine | |
1/s | Asymptotic shear rate limit of power law | EMC | Epoxy Molding Compound | |
° | Contact angle | FCBGA | Flip-Chip Ball-Grid-Array | |
m/s | Velocity field | FCP | Flip-Chip Package | |
Pa | Pressure field | FEM | Finite Element Method | |
1 | Volume Fraction of underfill | FSI | Fluid–Structure Interaction | |
1 | Volume Fraction of air | FVM | Finite Volume Method | |
ρ | kg/m³ | Mass density | GIC | Grid Convergence Index |
m/s² | Gravity | HRIC | High-Resolution Interface-Capturing scheme | |
N/m | Volumetric force | IGBT | Insulated-Gate Bipolar Transistor | |
N/m | Surface tension | LBM | Lattice–Boltzmann Method | |
1 | Interface normal | LS | Level-Set | |
1 | Interface curvature of the free surface | MCM | Multi-Chip Module | |
1 | Laplace–Beltrami operator of identity mapping | PCB | Printed Circuit Board | |
1 | Free surface | ROI | Region of Interest | |
Pa | Young–Laplace capillary pressure gradient | SFT | Free Surface Tension | |
m | Gap height | Si/SiC | Silicon/Silicon Carbide | |
Pa | Atmospheric pressure | MOSFET | Metal-Oxide-Semiconductor Field-Effect Transistor | |
1 | Mesh scaling factor | UDS | Upwind Differential Scheme | |
1 | Order of accuracy for GCI calculation | URF | Under-Relaxation Factor | |
1 | Safety factor (1.25 for three iterations) | VOF | Volume of Fluid | |
- | Simulated target value for mesh iteration | |||
- | True numerical target value | |||
s | Filling time for 90% gap coverage | |||
h | Required solver time | |||
° | Angle between interface and cell face normal | |||
1 | Angle factor of HRIC blending criterion | |||
1 | Blended normalized cell face value | |||
m/s | Root mean square of interface velocity magnitude for time t | |||
m/s | Interfacial velocity component in x, y, z | |||
1 | Number of cells at interface |
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Flow Calibration | IGBTs | Multi-Chip Module | |||
---|---|---|---|---|---|
FR4 | 800 µm | FR4 | 800 µm | FR4 | 800 µm |
Al2O3 | 360 µm | Al2O3 | 360 µm | Al2O3 | 360 µm |
- | - | Cu | 120 µm | - | - |
214 µm | SnSb5 | 110 µm | SnSb5 | 110 µm | |
430 µm | Sintered Ag | 80 µm | |||
12.7 mm × 21 mm 1 | 21 mm × 25.4 mm 1 | 25.4 mm × 38.6 mm 1 |
Filler Type | Filler Content (%) | Max Particle (µm) | Density (kg/m³) | |
Quartz | 67 | 1.5 | 1730 | |
Viscosity | Power law fit | |||
) | n (1) | (1/s) | (1/s) | |
(see Figure 2a) | 0.54 | 1.22 | 10 | 100 |
Gelling effect at 60 °C, ): | ||||
Surface Tension at 60 °C | (mN/m) | |||
SFT | Dispersive | Polar | ||
25 | 24.52 | 0.22 | ||
Contact angle at 60 °C (°) | ||||
FR4 | Al2O3 | Cu | SnSb5 | Ag |
35 | 25 | 33 | 30 [30] | 25 [31] |
Level-Set | VOF | ||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|
r = 2 | AMR | (s) | p | (s) | (h) | r = 2 | AMR | (s) | (s) | (h) | |
2 | 96.55 | 1.33 | 101.39 | 293.41 | 4 | 63.82 | 1.82 | 64.21 | 206.48 | ||
1 | 89.20 | 41.38 | 3 | 62.82 | 42.43 | ||||||
0 | 70.69 | 8.85 | 2 | 59.31 | 25.22 | ||||||
6.27% | 0.77% | ||||||||||
17.08% | 2.76% |
Continua Model | Parameter | Previous Model | Modified Model |
---|---|---|---|
AMR | Max. Refinement Level | 3 | 3 |
Transition Width | 6 | 6 | |
Delta Time (s) | 0.1 | 0.1 | |
ATS | Max. CFL Limit | 0.4 | 1.0 |
Multiphase Interaction | Semi-implicit Surface Tension | enabled | Enabled |
Interface Artificial Viscosity | 0.1 | 1.0 | |
HRIC | 0.5 | 0.5 | |
1.0 | 1.0 | ||
Sharpening Factor | 0.0 | 0.1 | |
Angle Factor | 0.05 | 1.0 | |
Segregated Flow | Enhanced Stability Treatment | enabled | enabled |
URF Velocity | 0.8 | 0.8 | |
URF Pressure | 0.2 | 0.2 | |
Segregated VOF | Solution Strategy | Single-Step | Multi-Step |
URF VOF | 0.9 | 0.9 | |
Number of Steps | 1 | 3 |
Flow Calibration | IGBTs | Multi-Chip Module | |||
---|---|---|---|---|---|
= 214 µm | 1.48% | U-shape | 2.55% | Dual-Chip | 2.84% |
= 430 µm | 3.04% | Comparted | 3.34% | Valved MCM | 2.79% |
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Stencel, L.C.; Strogies, J.; Müller, B.; Knofe, R.; Borwieck, C.; Heimann, M. Capillary Underfill Flow Simulation as a Design Tool for Flow-Optimized Encapsulation in Heterogenous Integration. Micromachines 2023, 14, 1885. https://doi.org/10.3390/mi14101885
Stencel LC, Strogies J, Müller B, Knofe R, Borwieck C, Heimann M. Capillary Underfill Flow Simulation as a Design Tool for Flow-Optimized Encapsulation in Heterogenous Integration. Micromachines. 2023; 14(10):1885. https://doi.org/10.3390/mi14101885
Chicago/Turabian StyleStencel, Lisa Christin, Jörg Strogies, Bernd Müller, Rüdiger Knofe, Carsten Borwieck, and Matthias Heimann. 2023. "Capillary Underfill Flow Simulation as a Design Tool for Flow-Optimized Encapsulation in Heterogenous Integration" Micromachines 14, no. 10: 1885. https://doi.org/10.3390/mi14101885
APA StyleStencel, L. C., Strogies, J., Müller, B., Knofe, R., Borwieck, C., & Heimann, M. (2023). Capillary Underfill Flow Simulation as a Design Tool for Flow-Optimized Encapsulation in Heterogenous Integration. Micromachines, 14(10), 1885. https://doi.org/10.3390/mi14101885