Li, Q.; Liu, J.; Dai, Y.; Xiang, W.; Zhang, M.; Wang, H.; Wen, L.
Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching. Micromachines 2016, 7, 232.
https://doi.org/10.3390/mi7120232
AMA Style
Li Q, Liu J, Dai Y, Xiang W, Zhang M, Wang H, Wen L.
Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching. Micromachines. 2016; 7(12):232.
https://doi.org/10.3390/mi7120232
Chicago/Turabian Style
Li, Qiang, Jie Liu, Yichuan Dai, Wushu Xiang, Man Zhang, Hai Wang, and Li Wen.
2016. "Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching" Micromachines 7, no. 12: 232.
https://doi.org/10.3390/mi7120232
APA Style
Li, Q., Liu, J., Dai, Y., Xiang, W., Zhang, M., Wang, H., & Wen, L.
(2016). Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching. Micromachines, 7(12), 232.
https://doi.org/10.3390/mi7120232