Wen, Z.; Liu, X.; Chen, W.; Zhou, R.; Wu, H.; Xia, Y.; Wu, L.
Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems. Polymers 2024, 16, 846.
https://doi.org/10.3390/polym16060846
AMA Style
Wen Z, Liu X, Chen W, Zhou R, Wu H, Xia Y, Wu L.
Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems. Polymers. 2024; 16(6):846.
https://doi.org/10.3390/polym16060846
Chicago/Turabian Style
Wen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia, and Lianbin Wu.
2024. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems" Polymers 16, no. 6: 846.
https://doi.org/10.3390/polym16060846
APA Style
Wen, Z., Liu, X., Chen, W., Zhou, R., Wu, H., Xia, Y., & Wu, L.
(2024). Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems. Polymers, 16(6), 846.
https://doi.org/10.3390/polym16060846