Boudaden, J.; Altmannshofer, S.; Wieland, R.; Pittroff, M.; Eisele, I.
An Approach to Reduce Greenhouse Gases in the Semiconductor Industry Using F2 Dissociated in Plasma for CVD Chamber Cleaning. Appl. Sci. 2018, 8, 846.
https://doi.org/10.3390/app8060846
AMA Style
Boudaden J, Altmannshofer S, Wieland R, Pittroff M, Eisele I.
An Approach to Reduce Greenhouse Gases in the Semiconductor Industry Using F2 Dissociated in Plasma for CVD Chamber Cleaning. Applied Sciences. 2018; 8(6):846.
https://doi.org/10.3390/app8060846
Chicago/Turabian Style
Boudaden, Jamila, Stephan Altmannshofer, Robert Wieland, Michael Pittroff, and Ignaz Eisele.
2018. "An Approach to Reduce Greenhouse Gases in the Semiconductor Industry Using F2 Dissociated in Plasma for CVD Chamber Cleaning" Applied Sciences 8, no. 6: 846.
https://doi.org/10.3390/app8060846
APA Style
Boudaden, J., Altmannshofer, S., Wieland, R., Pittroff, M., & Eisele, I.
(2018). An Approach to Reduce Greenhouse Gases in the Semiconductor Industry Using F2 Dissociated in Plasma for CVD Chamber Cleaning. Applied Sciences, 8(6), 846.
https://doi.org/10.3390/app8060846