Lin, R.; Han, P.; Wang, Y.; Lin, R.; Lu, Y.; Liu, Z.; Zhang, X.; Li, X.
Low Resistance Asymmetric III-Nitride Tunnel Junctions Designed by Machine Learning. Nanomaterials 2021, 11, 2466.
https://doi.org/10.3390/nano11102466
AMA Style
Lin R, Han P, Wang Y, Lin R, Lu Y, Liu Z, Zhang X, Li X.
Low Resistance Asymmetric III-Nitride Tunnel Junctions Designed by Machine Learning. Nanomaterials. 2021; 11(10):2466.
https://doi.org/10.3390/nano11102466
Chicago/Turabian Style
Lin, Rongyu, Peng Han, Yue Wang, Ronghui Lin, Yi Lu, Zhiyuan Liu, Xiangliang Zhang, and Xiaohang Li.
2021. "Low Resistance Asymmetric III-Nitride Tunnel Junctions Designed by Machine Learning" Nanomaterials 11, no. 10: 2466.
https://doi.org/10.3390/nano11102466
APA Style
Lin, R., Han, P., Wang, Y., Lin, R., Lu, Y., Liu, Z., Zhang, X., & Li, X.
(2021). Low Resistance Asymmetric III-Nitride Tunnel Junctions Designed by Machine Learning. Nanomaterials, 11(10), 2466.
https://doi.org/10.3390/nano11102466