Article Versions Notes

Huang P-H, Zhang Z-X, Hsu C-H, Wu W-Y, Ou S-L, Huang C-J, Wuu D-S, Lien S-Y, Zhu W-Z. Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO_x Films at Different Substrate Temperatures. Nanomaterials. 2022; 12(16):2859. https://doi.org/10.3390/nano12162859

Huang, Pao-Hsun, Zhi-Xuan Zhang, Chia-Hsun Hsu, Wan-Yu Wu, Sin-Liang Ou, Chien-Jung Huang, Dong-Sing Wuu, Shui-Yang Lien, and Wen-Zhang Zhu. 2022. "Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO_x Films at Different Substrate Temperatures" Nanomaterials 12, no. 16: 2859. https://doi.org/10.3390/nano12162859

Huang, P. -H., Zhang, Z. -X., Hsu, C. -H., Wu, W. -Y., Ou, S. -L., Huang, C. -J., Wuu, D. -S., Lien, S. -Y., & Zhu, W. -Z. (2022). Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO_x Films at Different Substrate Temperatures. Nanomaterials, 12(16), 2859. https://doi.org/10.3390/nano12162859