Lim, S.; Ahn, Y.; Won, B.; Lee, S.; Park, H.; Kumar, M.; Seo, H.
Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter. Nanomaterials 2024, 14, 1386.
https://doi.org/10.3390/nano14171386
AMA Style
Lim S, Ahn Y, Won B, Lee S, Park H, Kumar M, Seo H.
Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter. Nanomaterials. 2024; 14(17):1386.
https://doi.org/10.3390/nano14171386
Chicago/Turabian Style
Lim, Seokwon, Yeonghwan Ahn, Beomho Won, Suwan Lee, Hayoung Park, Mohit Kumar, and Hyungtak Seo.
2024. "Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter" Nanomaterials 14, no. 17: 1386.
https://doi.org/10.3390/nano14171386
APA Style
Lim, S., Ahn, Y., Won, B., Lee, S., Park, H., Kumar, M., & Seo, H.
(2024). Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter. Nanomaterials, 14(17), 1386.
https://doi.org/10.3390/nano14171386