Bairagi, S.; Järrendahl, K.; Eriksson, F.; Hultman, L.; Birch, J.; Hsiao, C.-L.
Glancing Angle Deposition and Growth Mechanism of Inclined AlN Nanostructures Using Reactive Magnetron Sputtering. Coatings 2020, 10, 768.
https://doi.org/10.3390/coatings10080768
AMA Style
Bairagi S, Järrendahl K, Eriksson F, Hultman L, Birch J, Hsiao C-L.
Glancing Angle Deposition and Growth Mechanism of Inclined AlN Nanostructures Using Reactive Magnetron Sputtering. Coatings. 2020; 10(8):768.
https://doi.org/10.3390/coatings10080768
Chicago/Turabian Style
Bairagi, Samiran, Kenneth Järrendahl, Fredrik Eriksson, Lars Hultman, Jens Birch, and Ching-Lien Hsiao.
2020. "Glancing Angle Deposition and Growth Mechanism of Inclined AlN Nanostructures Using Reactive Magnetron Sputtering" Coatings 10, no. 8: 768.
https://doi.org/10.3390/coatings10080768
APA Style
Bairagi, S., Järrendahl, K., Eriksson, F., Hultman, L., Birch, J., & Hsiao, C. -L.
(2020). Glancing Angle Deposition and Growth Mechanism of Inclined AlN Nanostructures Using Reactive Magnetron Sputtering. Coatings, 10(8), 768.
https://doi.org/10.3390/coatings10080768