Kim, Y.J.; Song, J.H.; Cho, K.H.; Shin, J.H.; Kim, J.S.; Yoon, J.S.; Hong, S.J.
Improved Plasma Etch Endpoint Detection Using Attention-Based Long Short-Term Memory Machine Learning. Electronics 2024, 13, 3577.
https://doi.org/10.3390/electronics13173577
AMA Style
Kim YJ, Song JH, Cho KH, Shin JH, Kim JS, Yoon JS, Hong SJ.
Improved Plasma Etch Endpoint Detection Using Attention-Based Long Short-Term Memory Machine Learning. Electronics. 2024; 13(17):3577.
https://doi.org/10.3390/electronics13173577
Chicago/Turabian Style
Kim, Ye Jin, Jung Ho Song, Ki Hwan Cho, Jong Hyeon Shin, Jong Sik Kim, Jung Sik Yoon, and Sang Jeen Hong.
2024. "Improved Plasma Etch Endpoint Detection Using Attention-Based Long Short-Term Memory Machine Learning" Electronics 13, no. 17: 3577.
https://doi.org/10.3390/electronics13173577
APA Style
Kim, Y. J., Song, J. H., Cho, K. H., Shin, J. H., Kim, J. S., Yoon, J. S., & Hong, S. J.
(2024). Improved Plasma Etch Endpoint Detection Using Attention-Based Long Short-Term Memory Machine Learning. Electronics, 13(17), 3577.
https://doi.org/10.3390/electronics13173577
