Micro/Nano Fabrication
A special issue of Micromachines (ISSN 2072-666X).
Deadline for manuscript submissions: closed (31 October 2014) | Viewed by 97744
Special Issue Editor
Special Issue Information
Dear Colleagues,
Lithography originally means the transfer of an image to a surface. Current photolithographic approaches, such as ultra-violet, electron-beam, X-ray and ion-beam, employ light exposure to pattern surfaces. Meanwhile, existing non-photolithographic methods use atomic force microscopes (dip-pen), soft (soft lithography) or hard molds (nanoimprint lithography), for example, to transfer patterns. In addition, non-lithographic approaches (like vapor-solid and vapor-liquid-solid), which do not involve the use of pre-existing images, may also be applied to generate tiny structures, such as nanorods, nanowires and nanotubes. Furthermore, the combination of various methods may create 3-D or hybrid micro/nano structures. This special issue seeks reviews, regular research papers and short communications on: (i) new approaches to fabricate micro/nano structures, and (ii) innovative use of existing techniques to generate new micro/nano structures.
Prof. Dr. Cheng Luo
Guest Editor
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
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Keywords
- micro/nano structures
- fabrication techniques and methods
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Related Special Issues
- Top-Down Micro- or Nanofabrication and Its Applications in Micromachines (10 articles)
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