Jang, S.K.; Lee, W.; Choi, G.I.; Kim, J.; Kang, M.; Kim, S.; Choi, J.H.; Kim, S.-G.; Lee, S.-K.; Kim, H.-U.;
et al. Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing. Sensors 2024, 24, 7307.
https://doi.org/10.3390/s24227307
AMA Style
Jang SK, Lee W, Choi GI, Kim J, Kang M, Kim S, Choi JH, Kim S-G, Lee S-K, Kim H-U,
et al. Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing. Sensors. 2024; 24(22):7307.
https://doi.org/10.3390/s24227307
Chicago/Turabian Style
Jang, Sung Kyu, Woosung Lee, Ga In Choi, Jihun Kim, Minji Kang, Seongho Kim, Jong Hyun Choi, Seul-Gi Kim, Seoung-Ki Lee, Hyeong-U Kim,
and et al. 2024. "Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing" Sensors 24, no. 22: 7307.
https://doi.org/10.3390/s24227307
APA Style
Jang, S. K., Lee, W., Choi, G. I., Kim, J., Kang, M., Kim, S., Choi, J. H., Kim, S. -G., Lee, S. -K., Kim, H. -U., & Kim, H.
(2024). Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing. Sensors, 24(22), 7307.
https://doi.org/10.3390/s24227307
