Karuwan, C.; Mantim, T.; Chaisuwan, P.; Wilairat, P.; Grudpan, K.; Jittangprasert, P.; Einaga, Y.; Chailapakul, O.; Suntornsuk, L.; Anurukvorakun, O.;
et al. Pulsed Amperometry for Anti-fouling of Boron-doped Diamond in Electroanalysis of β-Agonists: Application to Flow Injection for Pharmaceutical Analysis. Sensors 2006, 6, 1837-1850.
https://doi.org/10.3390/s6121837
AMA Style
Karuwan C, Mantim T, Chaisuwan P, Wilairat P, Grudpan K, Jittangprasert P, Einaga Y, Chailapakul O, Suntornsuk L, Anurukvorakun O,
et al. Pulsed Amperometry for Anti-fouling of Boron-doped Diamond in Electroanalysis of β-Agonists: Application to Flow Injection for Pharmaceutical Analysis. Sensors. 2006; 6(12):1837-1850.
https://doi.org/10.3390/s6121837
Chicago/Turabian Style
Karuwan, Chanpen, Thitirat Mantim, Patcharin Chaisuwan, Prapin Wilairat, Kate Grudpan, Piyada Jittangprasert, Yasuaki Einaga, Orawon Chailapakul, Leena Suntornsuk, Oraphan Anurukvorakun,
and et al. 2006. "Pulsed Amperometry for Anti-fouling of Boron-doped Diamond in Electroanalysis of β-Agonists: Application to Flow Injection for Pharmaceutical Analysis" Sensors 6, no. 12: 1837-1850.
https://doi.org/10.3390/s6121837
APA Style
Karuwan, C., Mantim, T., Chaisuwan, P., Wilairat, P., Grudpan, K., Jittangprasert, P., Einaga, Y., Chailapakul, O., Suntornsuk, L., Anurukvorakun, O., & Nacapricha, D.
(2006). Pulsed Amperometry for Anti-fouling of Boron-doped Diamond in Electroanalysis of β-Agonists: Application to Flow Injection for Pharmaceutical Analysis. Sensors, 6(12), 1837-1850.
https://doi.org/10.3390/s6121837
