Aerobic Treatment of Waste Process Solutions from the Semiconductor Industry: From Lab to Pilot Scale
Abstract
:1. Introduction
2. Materials and Methods
2.1. Feed Composition
- a photoresist solution (R2), EWC 14 06 03. This solution is an additional waste stream produced by the manufacturing processes of LFoundry: it is a mixture of organic substances, mainly 1-methoxy-2-propanol, with a total organic carbon (TOC) concentration of around 615 g/L. It was added as a source of carbon, in order to supply the optimal C/N ratio for the bacterial metabolism, that should be 20 by weight [21]. Such a ratio is indeed too low, around 3.5 in the TMAH molecule, thus the second waste stream R2 was added to the previously mentioned stream R1;
- a growth medium, whose composition is shown in Table 1.
2.2. Biological Tests
3. Results and Discussion
3.1. Kinetic Model
- µmax = 0.0425 ± 0.0034 h−1;
- KS = 800 ± 51 mg/L.
3.2. Biological Tests
- the pH value changed during each cycle: it increased to alkaline values and then came back towards neutral values after several days. This was apparently due to a buffering effect of the growth medium;
- NH4+ concentration increased with time: this was a clear indication of the TMAH degradation and indeed started after the adaptation period of 36–48 h;
- the TMAH concentration trend showed a rapid degradation and a further decrease toward zero, after the adaptation period. It is possible to hypothesize that, after nearly two days, the TMAH was adsorbed on the biomass and, afterward, was gradually decomposed, reaching concentrations very low if compared to the initial one. The final TMAH concentration obtained in the two batch cycles was 7 and 4 mg/L;
- the biomass concentration increased up to the tenth/eleventh day, but after that, it was rather constant, at around 1300–1500 mg/L.
4. Pilot Plant
5. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Compound | Concentration (mg/L) |
---|---|
CuCl2 | 140 |
Na2MoO4 | 250 |
NaHCO3 | 820 |
K2HPO4 | 210 |
MgSO4 | 510 |
FeCl3 | 110 |
Yeast Extract | 12 |
Parameter | Batch 1 (mg/L) | Batch 2 (mg/L) |
---|---|---|
pH | 7.20 | 6.95 |
COD | 5085 | 4863 |
TMAH | 1780 | 1625 |
NH4+ | 75 | 62 |
F− | 0.04 | 0.02 |
NO3− | <0.01 | <0.01 |
Cl− | 0.09 | 0.06 |
Sb, As, Cd, Cr, Hg, Ni, Pb, K, Se, Cu | <0.01 | <0.01 |
Na | 0.55 | 0.71 |
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Ferella, F.; Innocenzi, V.; Zueva, S.; Corradini, V.; Ippolito, N.M.; Birloaga, I.P.; De Michelis, I.; Prisciandaro, M.; Vegliò, F. Aerobic Treatment of Waste Process Solutions from the Semiconductor Industry: From Lab to Pilot Scale. Sustainability 2019, 11, 3923. https://doi.org/10.3390/su11143923
Ferella F, Innocenzi V, Zueva S, Corradini V, Ippolito NM, Birloaga IP, De Michelis I, Prisciandaro M, Vegliò F. Aerobic Treatment of Waste Process Solutions from the Semiconductor Industry: From Lab to Pilot Scale. Sustainability. 2019; 11(14):3923. https://doi.org/10.3390/su11143923
Chicago/Turabian StyleFerella, Francesco, Valentina Innocenzi, Svetlana Zueva, Valentina Corradini, Nicolò M. Ippolito, Ionela P. Birloaga, Ida De Michelis, Marina Prisciandaro, and Francesco Vegliò. 2019. "Aerobic Treatment of Waste Process Solutions from the Semiconductor Industry: From Lab to Pilot Scale" Sustainability 11, no. 14: 3923. https://doi.org/10.3390/su11143923
APA StyleFerella, F., Innocenzi, V., Zueva, S., Corradini, V., Ippolito, N. M., Birloaga, I. P., De Michelis, I., Prisciandaro, M., & Vegliò, F. (2019). Aerobic Treatment of Waste Process Solutions from the Semiconductor Industry: From Lab to Pilot Scale. Sustainability, 11(14), 3923. https://doi.org/10.3390/su11143923