Danilov, I.; Hackert-Oschätzchen, M.; Zinecker, M.; Meichsner, G.; Edelmann, J.; Schubert, A.
Process Understanding of Plasma Electrolytic Polishing through Multiphysics Simulation and Inline Metrology. Micromachines 2019, 10, 214.
https://doi.org/10.3390/mi10030214
AMA Style
Danilov I, Hackert-Oschätzchen M, Zinecker M, Meichsner G, Edelmann J, Schubert A.
Process Understanding of Plasma Electrolytic Polishing through Multiphysics Simulation and Inline Metrology. Micromachines. 2019; 10(3):214.
https://doi.org/10.3390/mi10030214
Chicago/Turabian Style
Danilov, Igor, Matthias Hackert-Oschätzchen, Mike Zinecker, Gunnar Meichsner, Jan Edelmann, and Andreas Schubert.
2019. "Process Understanding of Plasma Electrolytic Polishing through Multiphysics Simulation and Inline Metrology" Micromachines 10, no. 3: 214.
https://doi.org/10.3390/mi10030214
APA Style
Danilov, I., Hackert-Oschätzchen, M., Zinecker, M., Meichsner, G., Edelmann, J., & Schubert, A.
(2019). Process Understanding of Plasma Electrolytic Polishing through Multiphysics Simulation and Inline Metrology. Micromachines, 10(3), 214.
https://doi.org/10.3390/mi10030214