Tillocher, T.; Nos, J.; Antoun, G.; Lefaucheux, P.; Boufnichel, M.; Dussart, R.
Comparison between Bosch and STiGer Processes for Deep Silicon Etching. Micromachines 2021, 12, 1143.
https://doi.org/10.3390/mi12101143
AMA Style
Tillocher T, Nos J, Antoun G, Lefaucheux P, Boufnichel M, Dussart R.
Comparison between Bosch and STiGer Processes for Deep Silicon Etching. Micromachines. 2021; 12(10):1143.
https://doi.org/10.3390/mi12101143
Chicago/Turabian Style
Tillocher, Thomas, Jack Nos, Gaëlle Antoun, Philippe Lefaucheux, Mohamed Boufnichel, and Rémi Dussart.
2021. "Comparison between Bosch and STiGer Processes for Deep Silicon Etching" Micromachines 12, no. 10: 1143.
https://doi.org/10.3390/mi12101143
APA Style
Tillocher, T., Nos, J., Antoun, G., Lefaucheux, P., Boufnichel, M., & Dussart, R.
(2021). Comparison between Bosch and STiGer Processes for Deep Silicon Etching. Micromachines, 12(10), 1143.
https://doi.org/10.3390/mi12101143