Pan, H.; Yang, Y.; Li, L.; Zhang, Q.; Zheng, Z.; Du, X.; Chen, P.; Dong, J.; Lu, C.; Xie, X.;
et al. Optimization of Surface Acoustic Wave Resonators on 42°Y-X LiTaO3/SiO2/Poly-Si/Si Substrate for Improved Performance and Transverse Mode Suppression. Micromachines 2024, 15, 12.
https://doi.org/10.3390/mi15010012
AMA Style
Pan H, Yang Y, Li L, Zhang Q, Zheng Z, Du X, Chen P, Dong J, Lu C, Xie X,
et al. Optimization of Surface Acoustic Wave Resonators on 42°Y-X LiTaO3/SiO2/Poly-Si/Si Substrate for Improved Performance and Transverse Mode Suppression. Micromachines. 2024; 15(1):12.
https://doi.org/10.3390/mi15010012
Chicago/Turabian Style
Pan, Hongzhi, Yang Yang, Lingqi Li, Qiaozhen Zhang, Zeyu Zheng, Xuesong Du, Pingjing Chen, Jiahe Dong, Chuan Lu, Xiao Xie,
and et al. 2024. "Optimization of Surface Acoustic Wave Resonators on 42°Y-X LiTaO3/SiO2/Poly-Si/Si Substrate for Improved Performance and Transverse Mode Suppression" Micromachines 15, no. 1: 12.
https://doi.org/10.3390/mi15010012
APA Style
Pan, H., Yang, Y., Li, L., Zhang, Q., Zheng, Z., Du, X., Chen, P., Dong, J., Lu, C., Xie, X., Li, H., Xiao, Q., Ma, J., & Chen, Z.
(2024). Optimization of Surface Acoustic Wave Resonators on 42°Y-X LiTaO3/SiO2/Poly-Si/Si Substrate for Improved Performance and Transverse Mode Suppression. Micromachines, 15(1), 12.
https://doi.org/10.3390/mi15010012
