Liu, H.-W.; Chen, T.-H.; Chang, C.-H.; Lu, S.-K.; Lin, Y.-C.; Liu, D.-S.
Impact on the Gas Barrier Property of Silicon Oxide Films Prepared by Tetramethylsilane-Based PECVD Incorporating with Ammonia. Appl. Sci. 2017, 7, 56.
https://doi.org/10.3390/app7010056
AMA Style
Liu H-W, Chen T-H, Chang C-H, Lu S-K, Lin Y-C, Liu D-S.
Impact on the Gas Barrier Property of Silicon Oxide Films Prepared by Tetramethylsilane-Based PECVD Incorporating with Ammonia. Applied Sciences. 2017; 7(1):56.
https://doi.org/10.3390/app7010056
Chicago/Turabian Style
Liu, Hua-Wen, Tai-Hong Chen, Chun-Hao Chang, Shao-Kai Lu, Yi-Cyuan Lin, and Day-Shan Liu.
2017. "Impact on the Gas Barrier Property of Silicon Oxide Films Prepared by Tetramethylsilane-Based PECVD Incorporating with Ammonia" Applied Sciences 7, no. 1: 56.
https://doi.org/10.3390/app7010056
APA Style
Liu, H. -W., Chen, T. -H., Chang, C. -H., Lu, S. -K., Lin, Y. -C., & Liu, D. -S.
(2017). Impact on the Gas Barrier Property of Silicon Oxide Films Prepared by Tetramethylsilane-Based PECVD Incorporating with Ammonia. Applied Sciences, 7(1), 56.
https://doi.org/10.3390/app7010056