Magklaras, A.; Alefragis, P.; Gogos, C.; Valouxis, C.; Birbas, A.
A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. Information 2023, 14, 428.
https://doi.org/10.3390/info14080428
AMA Style
Magklaras A, Alefragis P, Gogos C, Valouxis C, Birbas A.
A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. Information. 2023; 14(8):428.
https://doi.org/10.3390/info14080428
Chicago/Turabian Style
Magklaras, Aris, Panayiotis Alefragis, Christos Gogos, Christos Valouxis, and Alexios Birbas.
2023. "A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography" Information 14, no. 8: 428.
https://doi.org/10.3390/info14080428
APA Style
Magklaras, A., Alefragis, P., Gogos, C., Valouxis, C., & Birbas, A.
(2023). A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. Information, 14(8), 428.
https://doi.org/10.3390/info14080428