Hu, Y.; Rasadujjaman, M.; Wang, Y.; Zhang, J.; Yan, J.; Baklanov, M.R.
Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates. Coatings 2021, 11, 937.
https://doi.org/10.3390/coatings11080937
AMA Style
Hu Y, Rasadujjaman M, Wang Y, Zhang J, Yan J, Baklanov MR.
Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates. Coatings. 2021; 11(8):937.
https://doi.org/10.3390/coatings11080937
Chicago/Turabian Style
Hu, Yingying, Md Rasadujjaman, Yanrong Wang, Jing Zhang, Jiang Yan, and Mikhail R. Baklanov.
2021. "Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates" Coatings 11, no. 8: 937.
https://doi.org/10.3390/coatings11080937
APA Style
Hu, Y., Rasadujjaman, M., Wang, Y., Zhang, J., Yan, J., & Baklanov, M. R.
(2021). Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates. Coatings, 11(8), 937.
https://doi.org/10.3390/coatings11080937