Romaniuk, S.; Nowakowska-Langier, K.; Strzelecki, G.W.; Mulewska, K.; Minikayev, R.
The Influence of Bias Voltage on the Structure and Properties of TiZrNbMo Coating Deposited by Magnetron Sputtering. Coatings 2024, 14, 844.
https://doi.org/10.3390/coatings14070844
AMA Style
Romaniuk S, Nowakowska-Langier K, Strzelecki GW, Mulewska K, Minikayev R.
The Influence of Bias Voltage on the Structure and Properties of TiZrNbMo Coating Deposited by Magnetron Sputtering. Coatings. 2024; 14(7):844.
https://doi.org/10.3390/coatings14070844
Chicago/Turabian Style
Romaniuk, Svitlana, Katarzyna Nowakowska-Langier, Grzegorz Witold Strzelecki, Katarzyna Mulewska, and Roman Minikayev.
2024. "The Influence of Bias Voltage on the Structure and Properties of TiZrNbMo Coating Deposited by Magnetron Sputtering" Coatings 14, no. 7: 844.
https://doi.org/10.3390/coatings14070844
APA Style
Romaniuk, S., Nowakowska-Langier, K., Strzelecki, G. W., Mulewska, K., & Minikayev, R.
(2024). The Influence of Bias Voltage on the Structure and Properties of TiZrNbMo Coating Deposited by Magnetron Sputtering. Coatings, 14(7), 844.
https://doi.org/10.3390/coatings14070844