Jauberteau, I.; Mayet, R.; Cornette, J.; Mangin, D.; Bessaudou, A.; Carles, P.; Jauberteau, J.L.; Passelergue, A.
Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings 2017, 7, 23.
https://doi.org/10.3390/coatings7020023
AMA Style
Jauberteau I, Mayet R, Cornette J, Mangin D, Bessaudou A, Carles P, Jauberteau JL, Passelergue A.
Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings. 2017; 7(2):23.
https://doi.org/10.3390/coatings7020023
Chicago/Turabian Style
Jauberteau, Isabelle, Richard Mayet, Julie Cornette, Denis Mangin, Annie Bessaudou, Pierre Carles, Jean Louis Jauberteau, and Armand Passelergue.
2017. "Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma" Coatings 7, no. 2: 23.
https://doi.org/10.3390/coatings7020023
APA Style
Jauberteau, I., Mayet, R., Cornette, J., Mangin, D., Bessaudou, A., Carles, P., Jauberteau, J. L., & Passelergue, A.
(2017). Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma. Coatings, 7(2), 23.
https://doi.org/10.3390/coatings7020023