Hu, C.-K.; Chen, C.-J.; Wei, T.-C.; Li, T.T.; Huang, C.-Y.; Chao, C.-L.; Lin, Y.-J.
Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor. Coatings 2017, 7, 112.
https://doi.org/10.3390/coatings7080112
AMA Style
Hu C-K, Chen C-J, Wei T-C, Li TT, Huang C-Y, Chao C-L, Lin Y-J.
Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor. Coatings. 2017; 7(8):112.
https://doi.org/10.3390/coatings7080112
Chicago/Turabian Style
Hu, Chih-Kai, Chun-Jung Chen, Ta-Chin Wei, Tomi T. Li, Chih-Yung Huang, Chu-Li Chao, and Yi-Jiun Lin.
2017. "Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor" Coatings 7, no. 8: 112.
https://doi.org/10.3390/coatings7080112
APA Style
Hu, C. -K., Chen, C. -J., Wei, T. -C., Li, T. T., Huang, C. -Y., Chao, C. -L., & Lin, Y. -J.
(2017). Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor. Coatings, 7(8), 112.
https://doi.org/10.3390/coatings7080112