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Article

Holographic Multi-Notch Filters Recorded with Simultaneous Double-Exposure Contact Mirror-Based Method

by
Bing-Han Zhuang
1,
Sheng-Chun Hung
2,
Kun-Huang Chen
2,
Chien-Hung Yeh
1 and
Jing-Heng Chen
1,*
1
Department of Photonics, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung 407102, Taiwan
2
Department of Electrical Engineering, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung 407102, Taiwan
*
Author to whom correspondence should be addressed.
Photonics 2024, 11(10), 977; https://doi.org/10.3390/photonics11100977
Submission received: 10 August 2024 / Revised: 10 October 2024 / Accepted: 15 October 2024 / Published: 18 October 2024
(This article belongs to the Special Issue Advances in Holography and Its Applications)

Abstract

:
This study presents a novel simultaneous double-exposure contact mirror-based method for fabricating holographic multi-notch filters with dual operational central wavelengths. The proposed method leverages coupled wave theory, the geometric relationships of K-vectors, and a reflection-type recording setup, incorporating additional reflecting mirrors to guide the recording beams. To validate the approach, a holographic notch filter was fabricated using photopolymer recording materials, resulting in operational wavelengths of 531.13 nm and 633.01 nm. The measured diffraction efficiencies at these wavelengths were ηs = 52.35% and ηp = 52.45% for 531.13 nm, and ηs = 67.30% and ηp = 67.40% for 633.01 nm. The component’s performance was analyzed using s- and p-polarized spectral transmission intensities at various reconstruction angles, revealing polarization-independent characteristics under normal incidence and polarization-dependent behavior under oblique incidence. The study also explored the relationships between recording parameters, such as incident angle, wavelength, emulsion expansion, and dispersion. The findings demonstrate that the first operational central wavelength is primarily influenced by the recording wavelength, while the second is primarily determined by the incident angle, covering a range from visible light to near-infrared. This method offers significant potential for cost-effective, mass-produced filters in optoelectronic applications.

1. Introduction

Filters can selectively transmit, reflect, or block specific wavelengths of electromagnetic radiation, playing a crucial role in various communication and imaging applications across a broad range of the electromagnetic spectrum [1,2,3,4]. These applications include optical communications [5,6,7], imaging and display [8,9,10,11], scientific research [3,12,13], and medical applications [9,14]. Based on their operating principles, filters can be broadly classified into three main types: absorption filters, scattering filters, and dichroic filters. Each type can be designed and fabricated according to different principles.
Traditional absorption filters include colored glass filters, plastic filters, and Wratten filters [15]. These filters control spectral properties by introducing elements, compounds, dyes, or other colorants into the substrate. Waveguide-type absorption filters, on the other hand, utilize the principle of guided mode resonances in waveguide structures to achieve spectral filtering [2,16]. Scattering filters embed small particles into the substrate and use the scattering properties of particles of different sizes to control the filter’s spectral characteristics [3,17].
Typical dichroic filters are made using optical coating techniques to create multilayer dielectric structures with alternating high and low refractive indices. They achieve selective transmission or reflection of specific wavelengths through the principle of thin-film interference [18]. When light is incident at a certain angle, different wavelengths are reflected or transmitted due to the interference effect. Since the number of coating layers can often exceed a hundred, the complexity and precision of the manufacturing process become a challenge, thus impacting the production cost. In contrast, volume holograms are fabricated using the double-beam interference principle, offering the advantages of ease of production and suitability for low-cost mass production [19,20,21]. Therefore, volume holograms provide a viable alternative to dichroic filters.
Research on holographic reflection filters can be traced back to the 1970s and 1980s [22,23]. To achieve high diffraction efficiency by ensuring better interference fringe contrast, the production of holographic reflection filters often adopts a symmetric double-beam interference recording setup [24,25]. To address the drawbacks of this setup’s large size and operational complexity, the single-beam Lippmann configuration has been employed. In this improved setup, to overcome the limitation of the incident beam exceeding the critical angle at the air–emulsion interface, a triangular prism is introduced to guide the beam [26]. A cylindrical prism is used to guide the recording beam, resulting in a holographic photopolymer linear variable filter with enhanced blue performance and significantly improved filter efficiency [27]. However, existing holographic reflection filters are typically designed to operate at a single central wavelength. Developing filters with dual-band capability would enhance their flexibility and application potential.
Accordingly, this paper proposes a recording method for fabricating holographic notch filters with two distinct operational central wavelengths. The holographic multi-notch filters produced using this method are flexible, easy to manufacture, cost-effective, and suitable for mass production. The designed operational wavelengths range from 0.45 μm in the visible spectrum to 1.80 μm in the near-infrared, demonstrating significant potential for modern optoelectronic applications.

2. Principles

Figure 1 and Figure 2 illustrate the schematic setups for the construction and reconstruction of holographic reflection filters based on the contact mirror method. The contact mirror-based method is a reflection-type holographic recording method using a single incident light beam. In the recording setups, the incident expanded beam (IEB) can be normally (IEBn) or obliquely (IEBθ) incident from air onto the holographic recording material (H) lying on the x-y plane, as shown in Figure 1a and Figure 2a. Before reaching the holographic recording material, the incident linearly polarized laser beam with a wavelength of λ1 passes through a half-wave plate (HWP), an electronic shutter (ES), a spatial filter (SF), and a collimating lens (CL). The application of the half-wave plate (HWP) ensures that the polarization of the incident laser beam is s-polarized (along the y-direction). Figure 1d and Figure 2d illustrate the reconstruction of the fabricated filters under the two aforementioned conditions.

2.1. Normally Incident Condition

In Figure 1a, the IEBn is normally incident onto H with a reflection mirror (M1) attached at the back. For ease of understanding, the protective coversheet (PC) (polycarbonate) of the recording material and the refractive index matching liquid are omitted. The details of geometric relations and material-related parameters are shown in Figure 1b. The thickness of the photosensitive emulsion (PE) in the recording material is d1, with a refractive index of nf1 (at λ1), and the refractive index matching liquid (RM) has a refractive index of nrm (at λ1). The IEBn serves as the reference beam R1,n, and the normally reflected light by the mirror serves as the object beam O1,n. R1,n and O1,n are two parallel beams in opposite directions inside the recording material. Accordingly, a set of interference fringes parallel to the emulsion plane can be easily recorded. The corresponding K-vector diagram and geometric relations are shown in Figure 1c, where kR1,n and kO1,n (with |kR1,n| = |kO1,n| = 2πnf1/λ1) are the propagation vectors for the reference and object beams, respectively, and K1,n (with |K1,n| = 2π/Λ1,n = 2|kR1,n|) is the grating vector with a grating period of Λ1,n, which is perpendicular to the emulsion plane.
Figure 1. (a) Schematic setup for the construction of holographic reflection filters under the normally incident condition (IEBn). (b) Geometric relations and material-related parameters for the normally incident condition. (c) K-vector diagram and geometric relations for the normally incident condition. (d) Reconstruction setup for the fabricated filter under the normally incident condition. (e) K-vector diagram for the reconstruction of the fabricated filter under the normally incident condition.
Figure 1. (a) Schematic setup for the construction of holographic reflection filters under the normally incident condition (IEBn). (b) Geometric relations and material-related parameters for the normally incident condition. (c) K-vector diagram and geometric relations for the normally incident condition. (d) Reconstruction setup for the fabricated filter under the normally incident condition. (e) K-vector diagram for the reconstruction of the fabricated filter under the normally incident condition.
Photonics 11 00977 g001
In Figure 1d, the fabricated filter is reconstructed using a normally incident, unpolarized reference beam R2,n with a wavelength of λ2,n. The object beam O2,n diffracts in the opposite direction at an angle of θd = 180° inside the hologram. The non-diffracted light passes through the element directly. Consider the changes in thickness and average refractive index of the photosensitive emulsion caused by exposure. The thickness of the photosensitive emulsion is d2, with an average refractive index of nf2,n (at λ2,n). The corresponding K-vector diagram is shown in Figure 1e, where kR2,n and kO2,n are the propagation vectors for the reference and object beams (|kR2,n| = |kO2,n| = 2πnf2,n/λ2,n, with nf2,n as the average refractive index of the emulsion at λ2,n), and K2,n (|K2,n| = 2π/Λ2,n = 2|kR2,n|) is the grating vector with a period of Λ2,n perpendicular to the emulsion plane. Accordingly, the relationship fulfilling the Bragg condition between the reconstruction wavelength λ2,n and the recording wavelength λ1 can be expressed as:
λ 2 , n = n f 2 , n n f 1 Λ 2 , n Λ 1 , n λ 1 .

2.2. Obliquely Incident Condition

In Figure 2a, the IEBθ is obliquely incident onto H at an angle θ. The details of geometric relations and material-related parameters are shown in Figure 2b. The thickness of the photosensitive emulsion in the recording material is d1, with a refractive index of nf1 (at λ1). The IEBθ serves as the reference beam R1,θ, and the light reflected by the mirror serves as the object beam O1,θ. The incident and reflection angles of R1,θ and O1,θ are θ in the air with respect to the surface normal of the recording material; after refraction, the corresponding incident and refraction angles in the emulsion of the recording material are θ′. R1,θ and O1,θ are two obliquely incident and reflected beams inside the recording material. Accordingly, a set of interference fringes parallel to the emulsion plane can be easily recorded. The corresponding K-vector diagram and geometric relations are shown in Figure 2c, where kR1,θ and kO1,θ (with |kR1,θ| = |kO1,θ| = 2πnf1/λ1) are the propagation vectors for the reference and object beams, respectively, and K1,θ (with |K1,θ| = 2π/Λ1,θ = 2|kR1,θ|cosθ′) is the grating vector with a grating period of Λ1,θ, which is perpendicular to the emulsion plane.
Figure 2. (a) Schematic setup for the construction of holographic reflection filters under the obliquely incident condition (IEBθ). (b) Geometric relations and material-related parameters for the obliquely incident condition. (c) K-vector diagram and geometric relations for the obliquely incident condition. (d) Reconstruction setup for the fabricated filter under the obliquely incident condition. (e) K-vector diagram for the reconstruction of the fabricated filter under the obliquely incident condition.
Figure 2. (a) Schematic setup for the construction of holographic reflection filters under the obliquely incident condition (IEBθ). (b) Geometric relations and material-related parameters for the obliquely incident condition. (c) K-vector diagram and geometric relations for the obliquely incident condition. (d) Reconstruction setup for the fabricated filter under the obliquely incident condition. (e) K-vector diagram for the reconstruction of the fabricated filter under the obliquely incident condition.
Photonics 11 00977 g002
In Figure 2d, the fabricated filter is reconstructed using a normally incident, unpolarized reference beam R2,θ with a wavelength of λ2,θ. The object beam O2,θ diffracts in the opposite direction at an angle of θd = 180° inside the hologram. The non-diffracted light passes through the element directly. Consider the changes in thickness and average refractive index of the photosensitive emulsion caused by exposure. The thickness of the photosensitive emulsion is d2, with an average refractive index of nf2,θ (at λ2,θ). The corresponding K-vector diagram is shown in Figure 2e, where kR2,θ and kO2,θ are the propagation vectors for the reference and object beams (|kR2,θ| = |kO2,θ| = 2πnf2,θ/λ2,θ, with nf2,θ as the average refractive index of the emulsion at λ2,θ), and K2,θ (|K2,θ| = 2π/Λ2,θ = 2|kR2,θ|) is the grating vector with a period of Λ2,θ perpendicular to the emulsion plane. Accordingly, the relationship fulfilling the Bragg condition between the reconstruction wavelength λ2,θ and the recording wavelength λ1 can be expressed as:
λ 2 , θ = n f 2 , θ n f 1 Λ 2 , θ Λ 1 , θ λ 1 cos θ ,
and when the operating wavelength of the filter is designed to be λ2,θ, the incident angle θ of the expanded beam IEBθ can be expressed as:
θ = sin 1 n f 1 1 n f 2 , θ n f 1 Λ 2 , θ Λ 1 , θ λ 1 λ 2 , θ 2 1 / 2 .

2.3. Simultaneous Double-Exposure Contact Mirror-Based Method

Based on the principles introduced in Section 2.1 and Section 2.2, combining the normally incident condition and the obliquely incident condition results in the method described in this section, as shown in Figure 3. This method guides the light beam by introducing two additional mirrors, M2 and M3. M2 is perpendicular to M1, and the angle between M3 and M2 is (90° − θ/2). Consequently, the expanded beam IEBθ is obliquely incident onto H at an angle θ and then reflected by mirror M1, completing the recording of the first set of interference fringes. The reflected beam is incident on mirror M2 at an angle of (90° − θ) and then reflected. This reflected beam is incident on M3 at an angle of θ/2, reflected again to become IEBn, and finally perpendicularly incident onto H, and reflected by M1, completing the recording of the second set of interference fringes. Therefore, a holographic multi-notch filter with two operational central wavelengths, λ2,n and λ2,θ, can be fabricated, utilizing multiple holograms.
According to the coupled wave theory [19], when the holographic filter is reconstructed with reference beam R2 incident perpendicularly and object beam O2 diffracted in the opposite direction with a diffraction angle θd = 180°, as shown in Figure 1d and Figure 2d, the s- and p-polarized components of R2 have the same diffraction efficiency. Accordingly, for the two operational central wavelengths λ2,n and λ2,θ, the diffraction efficiencies of the s- and p-polarized components can be expressed as:
η s , p , l = tanh 2 π Δ n l d 2 λ 2 , l = tanh 2 π Δ N l ,
where l represents n or θ, Δnn and Δnθ are the modulation refractive index amplitudes, d2 is the emulsion thickness, λ2,n and λ2,θ are the wavelengths of the reconstruction light, and ΔNn and ΔNθ are the effective refractive modulation.
Figure 3. Schematic setup for the simultaneous double-exposure contact mirror-based method, combining both normally and obliquely incident conditions.
Figure 3. Schematic setup for the simultaneous double-exposure contact mirror-based method, combining both normally and obliquely incident conditions.
Photonics 11 00977 g003

3. Experimental Results and Discussion

To verify the feasibility of the method proposed in this study, a holographic multi-notch filter with dual operational central wavelengths was fabricated. The optical recording setup is shown in Figure 3. In this setup, the incident expanded beam (IEBθ) was incident onto the holographic recording material (H) and M1 at an oblique angle of θ = 55°. M2 was perpendicular to M1, and the angle between M3 and M2 was 62.5°. A photopolymer recording material (C-RT20, Litiholo, Hampton, VA, USA) with a thickness of 16 μm, which does not require chemical post-processing, was attached to the first mirror (M1). Water (nrm = 1.33 at 532 nm) was used as the refractive index matching liquid. A 50 mW diode-pumped solid-state laser (GLM-SOPT-50, LEADLIGHT TECHNOLOGY, INC., Taoyuan City, Taiwan) with a linearly polarized output at a wavelength of 532 nm was used for recording. The recommended exposure energy for C-RT20 at this wavelength is approximately 30 mJ/cm2. The irradiance of the incident expanded beam (IEBθ) was 0.639 mW/cm2. The actual exposure time was 300 s, with an exposure energy of 192 mJ/cm2. Since the Litiholo film develops as it is exposed, any additional laser exposure will have only a minor effect after the film has used up all of its exposure capacity. After exposure and drying, as shown in Figure 4, the fabricated holographic multi-notch filter (with dimensions approximately 8 mm × 7 mm) exhibited a brilliant rainbow appearance under white light illumination that varied with the observation angle, confirming the successful recording of interference fringes.

3.1. Measurement of Transmittances and Diffraction Efficiencies

The fabricated holographic multi-notch filter, mounted on a rotation stage, was tested at different reconstruction incident angles (θi) using a linearly polarization-controlled tungsten halogen white-light source (HL-2000, Ocean Optics, Dunedin, FL, USA) combined with a spectrometer (HR4000CG-UV-NIR, Ocean Optics), as shown in Figure 5. During the operation of the measurement system, only the holographic filter was rotated, while all other components remained fixed. The transmitted light was collected by the fiber optic, which had a collection microlens in front of it, and then directed to the spectrometer. To reveal the characteristics and details of the component and this recording method, the reconstruction incident angles (θi) were set to 0°, 10°, 20°, 30°, 40°, and 50°. The s- and p-polarized spectral intensities of the white-light source, Iin,s,p(λ), and the transmitted light through the holographic filter, Iout,s,p(λ), were measured. Using the measured data, the transmittance Ts,p,θi(λ) can be expressed as:
T s , p , θ i λ = t 1 , s , p , θ i λ t 2 , s , p , θ i λ = I o u t , s , p ( λ ) I i n , s , p ( λ ) × 100 % ,
where the subscripts θi, s, and p represent the values of the incident angle (θi) and the s- and p-polarized components, respectively. t 1 , s , p , θ i λ represents the transmittance caused by the material, and t 2 , s , p , θ i λ represents the transmittance caused by grating diffraction. t 2 , s , p , θ i λ   = 1 − ηs,p,θi(λ), where ηs,p,θi(λ) is the spectral diffraction efficiency within the emulsion of the fabricated holographic filter. Accordingly, the spectral diffraction efficiencies ηs,p,θi(λ) can be expressed as:
η s , p , θ i λ = 1 I o u t , s , p λ I i n , s , p λ t 1 , s , p , θ i λ × 100 % .
Using Equations (5) and (6), Figure 6 and Figure 7 show the transmittances for s- and p-polarizations and the spectral diffraction efficiencies within the emulsion for the holographic filter at normal incidence (θi = 0°) and at various reconstruction angles of incidence (θi = 10°, 20°, 30°, 40°, and 50°), respectively. The incident angles and corresponding dual operational central wavelengths, s- and p-polarization transmittances and diffraction efficiencies, and full widths at half maximum (FWHMs) are summarized in Table 1.
Figure 5. Experimental setup for testing the fabricated holographic multi-notch filter at different reconstruction incident angles (θi).
Figure 5. Experimental setup for testing the fabricated holographic multi-notch filter at different reconstruction incident angles (θi).
Photonics 11 00977 g005

3.1.1. Analysis of Transmittances and Diffraction Efficiencies Under the Normally Incident Reconstruction Condition

In Figure 6a, the holographic filter demonstrates polarization-independent dual operational central wavelengths at λ 2 , n = 531.13 nm and λ 2 , θ = 633.01 nm, with transmittances Ts,p,0 of 33% and 23%, respectively. Due to the lack of anti-reflection coating on the component surface, the material transmittance of the non-filtered wavelength range is between t 1 , s , p , 0 425 = 66% and t 1 , s , p , 0 675 = 71%, which can be improved with an anti-reflection coating. Figure 6b shows the diffraction efficiencies ηs,p,0 within the emulsion for these two operating wavelengths, which are ηs,0 = 52.35% and ηp,0 = 52.45% for 531.13 nm, and ηs,0 = 67.30% and ηp,0 = 67.40% for 633.01 nm, with full width at half maximum (FWHM) values of 10.3 nm and 13.2 nm, respectively. These results confirm the dual operational central wavelength filtering function of the fabricated holographic filter. In the presentation of Figure 6b, to avoid negative values for the diffraction efficiency in the longer wavelength range, the transmittance t 1 , s , p , θ i λ was set to 70% when calculating the diffraction efficiency curve using Equation (6).
Due to the limitations imposed by the emulsion thickness, the diffraction efficiencies for these two operational central wavelengths are relatively low. Using Equation (4), considering λ2,n = 531.13 nm, λ2,θ = 633.01 nm, ηs,p,n = 52.4%, ηs,p,θ = 67.35%, and d2 = 16 μm, solving the equations yields Δnn = 0.00968 and Δnθ = 0.01459, and ΔNn = 0.91610 and ΔNθ = 1.15855. Due to λ2,n being allocated a smaller effective refractive modulation compared to λ2,θ, it has a lower diffraction efficiency. Using these parameters, the relationship between ηs,p and d2 was plotted. As shown in Figure 8, when d2 > 32 μm, the diffraction efficiencies for these two operational central wavelengths can exceed 90%. Therefore, higher diffraction efficiencies can be achieved by using the same commercial recording material with a greater thickness, or by increasing the refractive index modulation strength of the recording material.
In practice, in the recording setup of Figure 3, in addition to the two sets of gratings recorded by the interference of IEBθ and IEBn and their beam reflected by M1, there should be four additional sets, two transmission gratings and two reflection gratings, resulting from the mutual interference between IEBθ, IEBn, and their reflected beams. These four sets of gratings do not diffract light at 180° during reconstruction like the original two sets; however, this does not affect the functionality of the filter. Furthermore, the theoretical reconstruction wavelengths for all four sets of gratings are close to 532 nm. However, as seen in Figure 6a, the transmission dip at 531.13 nm is not as pronounced as the one at 633.01 nm. A reasonable explanation is that after penetrating multiple interfaces, IEBθ becomes IEBn, and the ratio of the irradiances of IEBθ and IEBn is so disparate that it cannot maintain optimum modulation to form clear grating structures.

3.1.2. Analysis of Transmittances and Diffraction Efficiencies Under the Obliquely Incident Reconstruction Conditions

As shown in Figure 7a,b, it is evident that as the reconstruction incident angle increases from 0° to 50°, the dual operational central wavelengths of the multi-notch filter shift from 531.13 nm and 633.01 nm to shorter wavelengths of 457.73 nm and 545.11 nm, as summarized in Table 1. Due to the oblique incidence, the reconstruction beam R2 and the diffracted beam O2, which satisfy the Bragg condition, must have larger propagation vectors (|kR2,n| = |kO2,n| = 2πnf2/λ2,n and |kR2,θ| = |kO2,θ| = 2πnf2/λ2,θ) to form a closed isosceles triangle vector geometry with the inherent grating vector K2,n and K2,θ, as shown in Figure 9a,b. Therefore, a larger reconstruction incident angle corresponds to a larger propagation vector, i.e., shorter reconstruction wavelengths ( λ 2 , n   a n d   λ 2 , θ ). In Figure 9, the angle θ i is the refraction angle of the test light in the emulsion after it enters the component from the air.
In Figure 7a and Table 1, the transmittances for s- and p-polarizations of the filter show opposite trends as the reconstruction incident angle increases from 0° to 50°. This opposite trend is consistent with Fresnel transmittances (air to emulsion), where Ts decreases with increasing incident angle, and Tp increases with increasing incident angle between 0° and Brewster’s angle. The transmittance for s-polarization (Ts) of the dual operational central wavelengths generally decreased from 33.36% and 22.89% at 0° to 25.93% and 13.35% at 50°. The transmittance for p-polarization (Tp) of the dual operating wavelengths showed an increasing trend from 33.28% and 22.82% at 0° to 55.37% and 48.20% at 50°. In addition, at a larger reconstruction incident angle of 50°, the dispersion characteristics are significant, with Tp increasing with wavelength.
In Figure 7b and Table 1, the s- and p-polarization diffraction efficiencies within the emulsion for the dual operating wavelengths also show opposite trends as the reconstruction incident angle increases from 0° to 50°. The diffraction efficiency for s-polarization (ηs) of the dual operating wavelengths generally increased from 52.35% for 531.13 nm and 67.30% for 633.01 nm at 0° to 60.94% for 457.73 nm and 80.21% for 545.11 nm at 50°. The diffraction efficiency for p-polarization (ηp) of the dual operating wavelengths showed a decreasing trend from 52.45% for 531.13 nm and 67.40% for 633.01 nm at 0° to 30.57% for 457.73 nm and 39.51% for 545.11 nm at 50°. The full widths at half maximum (FWHMs) for s- and p-polarizations of these dual operating wavelengths slightly fluctuated between 9.67 nm and 14.9 nm as the reconstruction incident angle increased from 0° to 50°. In the presentation of Figure 7b, to avoid negative values for the diffraction efficiency in the longer wavelength range, the transmittances t 1 , s , p , θ i λ were set to values between 67% to 80% when calculating the diffraction efficiency curve using Equation (6).
According to the coupled wave theory [19], as shown in Figure 5 and Figure 9, when test light is incident at an oblique angle θ i and is diffracted at an angle θd = 180° − θ i within the emulsion, the diffraction efficiencies for the s- and p-polarizations of the holographic filter can be expressed as:
η s , p = 1 1 + 1 s i n h 2 υ ,
where
υ = υ s = i π Δ n d 2 λ r c o s 2 θ i 1 / 2 ,
and
υ = υ p = υ s c o s 2 θ i ,
where υs and υp are the coupling coefficients for the s- and p-polarizations, Δn is the modulation refractive index amplitude, d2 is the emulsion thickness, and λr is the wavelength of the reconstruction light. When θ i = 0°, the Equations (7)–(9) can be simplified into the form of Equation (4). Considering λr = 531.13 nm, Δn = 0.00968, and d2 = 16 μm, the relationship between θ i and the diffraction efficiency ηs,p can be obtained using Equations (7)–(9), as shown in Figure 10. From Figure 10, it is evident that the holographic filter is polarization-independent with the same diffraction efficiencies for s- and p-polarizations when the reconstruction light is incident perpendicularly ( θ i = 0°). When the reconstruction light is incident at a large angle ( θ i approaching 80°), the component remains polarization-independent with nearly 100% diffraction efficiency. For any other incident angles (0° < θ i < 80°), the component exhibits polarization dependence, with the diffraction efficiencies for s- and p-polarizations being functions of the incident angle ( θ i ). This explains the varying trends in s- and p-polarization diffraction efficiencies observed in Figure 7b and Table 1. Additionally, Figure 10 shows that the diffraction efficiency for p-polarization is zero when the incident light is at θ i = 45°.

3.2. Relationships Between Recording Incident Angle, Recording Wavelength, and Dual Operational Central Wavelengths

From Equations (1)–(3), it is evident that the two operational central wavelengths of the fabricated holographic multi-notch filter, λ2,n and λ2,θ, are related to the recording wavelength λ1, the dispersion characteristics of the photosensitive emulsion used in the holographic recording material, the emulsion’s expansion and contraction, and the recording incident angle θ of the exposure beam IEBθ.
To understand the feasible wavelength range for the holographic multi-notch filter fabricated by the method proposed in this study, we consider simplified general conditions to explore the relationships between the recording incident angle θ (referred to as θ′ in the emulsion), the recording wavelength λ1, and the corresponding normal reconstruction dual wavelengths λ2,n and λ2,θ.
Using the dispersion data of poly(methyl methacrylate) (PMMA), the main component of pan-photopolymer recording materials, we simulate the relationships between the recording incident angle, the recording wavelength, and the dual operational central wavelengths. The dispersion formula for PMMA can be expressed as [28]:
n 2 1 = 1.1819 λ 2 λ 2 0.011313
By substituting the experimental parameters λ1 = 532 nm and λ2,n = 531.13 nm into Equation (1) and ignoring the emulsion’s expansion and contraction, we find that the refractive index of the photopolymer after exposure is less than that before exposure, with a ratio of nf2,n/nf1 = 0.998. Therefore, the refractive index change approximates 0.0024.
According to Equations (1), (2) and (10), and as shown in Table 2, we consider common commercial holographic laser sources with wavelengths λ1 = 0.450  μm, 0.532  μm, and 0.633 μm. Using the simulation parameters nf1 = 1.5006 (at λ1 = 0.450  μm), 1.4937 (at λ1 = 0.532  μm), 1.4887 (at λ1 = 0.633  μm), a refractive index change value of 0.0024, and a grating period ratio Λ2,n/Λ1,n = 1, the first operational central wavelengths λ2,n of the dual operating wavelength holographic notch filter are calculated to be 0.449 μm, 0.531 μm, and 0.632 μm, respectively.
As shown in Figure 11, the second operational central wavelength λ2,θ increases with the recording incident angle θ′ in the emulsion, covering a range from visible light to the near-infrared. Compared to the refractive index of the photopolymer recording material, the second operational central wavelength λ2,θ is primarily determined by the recording incident angle θ′. Longer recording wavelengths λ1 correspond to larger operational wavelengths λ2,θ. In cases of larger incident angles θ′, an isosceles trapezoid prism can be used to guide the recording beam for better component recording effects, as shown in Figure 12.

4. Conclusions

This study introduces a method for recording holographic multi-notch filters using simultaneous double-exposure with a contact mirror setup. The fabricated component’s characteristics were analyzed using polarized spectral transmittance at different reconstruction angles. The component exhibited polarization-independent transmission and diffraction efficiency under normal incidence but displayed polarization-dependent behavior under oblique incidence. When the emulsion thickness exceeded 32 µm, the diffraction efficiency could exceed 90%, significantly enhancing the notch filtering performance. The first operational wavelength is mainly determined by the recording wavelength, while the second is influenced by the incident angle, covering a range from visible light to near-infrared. This method offers significant potential for cost-effective, mass-produced filters in optoelectronic applications.

Author Contributions

J.-H.C. and B.-H.Z. conceived and designed the experiments; B.-H.Z. performed the experiments; J.-H.C., B.-H.Z. and S.-C.H. analyzed the data; J.-H.C., S.-C.H., K.-H.C. and C.-H.Y. contributed to the materials and provided discussions; J.-H.C., B.-H.Z. and S.-C.H. wrote the paper. All authors have read and agreed to the published version of the manuscript.

Funding

This research was funded by the National Science and Technology Council of the Republic of China, grant number NSTC 112-2221-E-035-068.

Institutional Review Board Statement

Not applicable.

Informed Consent Statement

Not applicable.

Data Availability Statement

The original contributions presented in the study are included in the article, further inquiries can be directed to the corresponding author.

Conflicts of Interest

The authors declare no conflicts of interest.

References

  1. Ulrich, R. Interference filters for the far infrared. Appl. Opt. 1968, 7, 1987–1996. [Google Scholar] [CrossRef] [PubMed]
  2. Liu, J.-N.; Schulmerich, M.V.; Bhargava, R.; Cunningham, B.T. Optimally designed narrowband guided-mode resonance reflectance filters for mid-infrared spectroscopy. Opt. Express 2011, 19, 24182–24197. [Google Scholar] [CrossRef] [PubMed]
  3. Essinger-Hileman, T.; Bennett, C.; Corbett, L.; Guo, H.; Helson, K.; Marriage, T.; Meador, M.A.B.; Rostem, K.; Wollack, E.J. Aerogel scattering filters for cosmic microwave background observations. Appl. Opt. 2020, 59, 5439–5446. [Google Scholar] [CrossRef]
  4. Zhu, X.; Yu, K.; Zhu, X.; Wu, C. Wavelength-tunable deep-ultraviolet thin-film filter: Design and experimental demonstration. Appl. Opt. 2021, 60, 10199–10206. [Google Scholar] [CrossRef]
  5. Melloni, A.; Martinelli, M. Synthesis of direct-coupled-resonators bandpass filters for WDM systems. J. Light. Technol. 2002, 20, 296–303. [Google Scholar] [CrossRef]
  6. Darvish, G.; Moravvej-Farshi, M.K.; Zarifkar, A.; Saghafi, K. Narrowband optical filters suitable for various applications in optical communications. Appl. Opt. 2008, 47, 5140–5146. [Google Scholar] [CrossRef]
  7. Li, F.; Zou, D.; Ding, L.; Sun, Y.; Li, J.; Sui, Q.; Li, L.; Yi, X.; Li, Z. 100 Gbit/s PAM4 signal transmission and reception for 2-km interconnect with adaptive notch filter for narrowband interference. Opt. Express 2018, 26, 24066–24074. [Google Scholar] [CrossRef]
  8. Young, M. Linewidth measurement by high-pass filtering: A new look. Appl. Opt. 1983, 22, 2022–2025. [Google Scholar] [CrossRef]
  9. Li, Y.-Y.; Chen, J.-J.; Feng, H.-H.; Chen, H.; Wang, Q.-M. Rugate filters used in slit-lamp delivery to improve color rendering of illumination for retinal photocoagulation. Appl. Opt. 2014, 53, 3361–3369. [Google Scholar] [CrossRef]
  10. Gao, S.; McLean, D.; Lai, J.; Micou, C.; Nathan, A. Reduction of noise spikes in touch screen systems by low pass spatial filtering. J. Disp. Technol. 2016, 12, 957–963. [Google Scholar] [CrossRef]
  11. Sun, Y.; Zhang, C.; Yang, Y.; Ma, H.; Sun, Y. Improving the color gamut of a liquid-crystal display by using a bandpass filter. Curr. Opt. Photonics 2019, 3, 590–596. [Google Scholar]
  12. Behrendt, A.; Reichardt, J. Atmospheric temperature profiling in the presence of clouds with a pure rotational Raman lidar by use of an interference-filter-based polychromator. Appl. Opt. 2000, 39, 1372–1378. [Google Scholar] [CrossRef] [PubMed]
  13. Zhang, X.; Li, B.; Zhi, D.-D.; Fang, X.; Li, T.; Du, W.-F.; Wang, X.-X.; Li, H.-S.; Sun, F.-K.; Gu, G.C. Stray light analysis and suppression of a UV multiple sub-pupil ultra-spectral imager. Appl. Opt. 2024, 63, 6112–6120. [Google Scholar] [CrossRef]
  14. Labuz, G.; Papadatou, E.; Vargas-Martín, F.; López-Gil, N.; Reus, N.J.; Berg, T.J.T.P.V. Validation of a spectral light scattering method to differentiate large from small particles in intraocular lenses. Biomed. Opt. Express 2017, 8, 1889–1894. [Google Scholar] [CrossRef] [PubMed]
  15. Edmund Optics. Optical Filters. Available online: https://www.edmundoptics.com.tw/knowledge-center/application-notes/optics/optical-filters (accessed on 3 August 2024).
  16. Peng, W.; Zhang, G.; Lv, Y.; Qin, L.; Qi, K. Ultra-narrowband absorption filter based on a multilayer waveguide structure. Opt. Express 2021, 29, 14582–14600. [Google Scholar] [CrossRef]
  17. Barlis, A.; Guo, H.; Helson, K.; Bennett, C.; Chan, C.Y.Y.; Marriage, T.; Quijada, M.; Tokarz, A.; Vivod, S.; Wollack, E.; et al. Fabrication and characterization of optical filters from polymeric aerogels loaded with diamond scattering particles. Appl. Opt. 2024, 63, 6036–6051. [Google Scholar] [CrossRef]
  18. Hecht, E. Amplitude-Splitting Interferometers. In OPTICS, 5th ed.; Pearson: New York, NY, USA, 2017; pp. 416–431. [Google Scholar]
  19. Kogelnik, H. Coupled wave theory for thick hologram gratings. Bell Syst. Tech. J. 1969, 48, 2909–2947. [Google Scholar] [CrossRef]
  20. Huang, Y.-T. Polarization-selective volume holograms: General design. Appl. Opt. 1994, 33, 2115–2120. [Google Scholar] [CrossRef]
  21. Chen, J.-H.; Tseng, H.-L.; Hsu, F.-H.; Han, C.-Y.; Chen, K.-H.; Yeh, C.-H.; Hsu, K.-Y. Design and Fabrication of a Holographic Radial Polarization Converter. Photonics 2020, 7, 85. [Google Scholar] [CrossRef]
  22. Righini, G.C.; Russo, V.; Sottini, S. Reflection Holographic Filters for Compacting Optical Processors. Appl. Opt. 1974, 13, 1019–1022. [Google Scholar] [CrossRef]
  23. Molesini, G. Reflection holographic gratings for optical filtering. Opt. Acta 1984, 31, 903–916. [Google Scholar] [CrossRef]
  24. Liu, D.; Tang, W.; Chou, J.; Huang, W. The study on the narrow band holographic reflection filters. In Proceedings of the International Conference on Holography Applications, Beijing, China, 2–4 July 1986; Volume 673, pp. 463–469. [Google Scholar]
  25. Zhang, G.; Montemezzani, G.; Günter, P. Narrow-bandwidth holographic reflection filters with photopolymer films. Appl. Opt. 2001, 40, 2423–2427. [Google Scholar] [CrossRef] [PubMed]
  26. Zhang, D.; Gordon, M.; Russo, J.M.; Vorndran, S.; Escarra, M.; Atwater, H.; Kostuk, R.K. Reflection hologram solar spectrum-splitting filters. In Proceedings of the High and Low Concentrator Systems for Solar Electric Applications VII, San Diego, CA, USA, 12–16 August 2012. [Google Scholar]
  27. Moein, T.; Ji, D.; Zeng, X.; Liu, K.; Gan, Q.; Cartwright, A.N. Holographic Photopolymer Linear Variable Filter with Enhanced Blue Reflection. ACS Appl. Mater. Interfaces 2014, 6, 3081–3087. [Google Scholar] [CrossRef] [PubMed]
  28. Sultanova, N.; Kasarova, S.; Nikolov, I. Refractive Index of Poly(methyl methacrylate) (PMMA)—Sultanova. Available online: https://refractiveindex.info/?shelf=organic&book=poly(methyl_methacrylate)&page=Sultanova (accessed on 3 August 2024).
Figure 4. Photograph of the fabricated holographic multi-notch filter, which exhibits a brilliant rainbow appearance under white light illumination, with dimensions approximately 8 mm × 7 mm.
Figure 4. Photograph of the fabricated holographic multi-notch filter, which exhibits a brilliant rainbow appearance under white light illumination, with dimensions approximately 8 mm × 7 mm.
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Figure 6. (a) Transmittances and (b) spectral diffraction efficiencies for s- and p-polarizations of the holographic multi-notch filter at normal incidence (θi = 0°).
Figure 6. (a) Transmittances and (b) spectral diffraction efficiencies for s- and p-polarizations of the holographic multi-notch filter at normal incidence (θi = 0°).
Photonics 11 00977 g006aPhotonics 11 00977 g006b
Figure 7. (a) Transmittances and (b) spectral diffraction efficiencies for s- and p-polarizations of the holographic multi-notch filter at various incident angles (θi = 10°, 20°, 30°, 40°, and 50°).
Figure 7. (a) Transmittances and (b) spectral diffraction efficiencies for s- and p-polarizations of the holographic multi-notch filter at various incident angles (θi = 10°, 20°, 30°, 40°, and 50°).
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Figure 8. Relationship between diffraction efficiencies (ηs,p) and emulsion thickness (d2) for the two operational central wavelengths, λ2,n = 531.13 nm, λ2,θ = 633.01 nm.
Figure 8. Relationship between diffraction efficiencies (ηs,p) and emulsion thickness (d2) for the two operational central wavelengths, λ2,n = 531.13 nm, λ2,θ = 633.01 nm.
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Figure 9. K-vector diagrams for the reconstruction of inherent grating vector (a) K2,n and (b) K2,θ under test light oblique incidence at θi inside the emulsion.
Figure 9. K-vector diagrams for the reconstruction of inherent grating vector (a) K2,n and (b) K2,θ under test light oblique incidence at θi inside the emulsion.
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Figure 10. The relationship between the incident angle θi and the diffraction efficiency ηs,p for both s- and p-polarizations of the holographic filter.
Figure 10. The relationship between the incident angle θi and the diffraction efficiency ηs,p for both s- and p-polarizations of the holographic filter.
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Figure 11. Dependence of the second operational wavelength on the recording incident angle θ′ for different recording wavelengths.
Figure 11. Dependence of the second operational wavelength on the recording incident angle θ′ for different recording wavelengths.
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Figure 12. Schematic of an isosceles trapezoid prism used to guide the recording beams.
Figure 12. Schematic of an isosceles trapezoid prism used to guide the recording beams.
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Table 1. Summary of the corresponding wavelengths, transmittances, diffraction efficiencies, and full widths at half maximum (FWHMs) of the holographic filter at various incident angles.
Table 1. Summary of the corresponding wavelengths, transmittances, diffraction efficiencies, and full widths at half maximum (FWHMs) of the holographic filter at various incident angles.
Incident Angle (°)Wavelength (nm)Ts (%)Tp (%)ηs (%)ηp (%)FWHM(s/p) (nm)
0531.1333.3633.2852.3552.4510.3/10.3
633.0122.8922.8267.3067.4013.2/13.2
10527.5233.0133.7151.5251.7111.6/11.9
630.2126.1226.5461.6561.9814.8/14.8
20517.0130.8735.0654.1350.6210.6/11.1
617.2622.1826.9067.0562.1113.2/13.2
30501.2829.0739.6757.3848.4210.3/10.6
598.1619.3930.6671.5760.1313.5/12.5
40480.3527.5646.3560.1242.059.67/14.8
572.6018.6442.1273.0247.4714.4/13.6
50457.7325.9355.3760.9430.5712.0/17.7
545.1113.3548.2080.2139.5114.9/12.6
Table 2. Summary of wavelengths (λ1), initial refractive indices (nf1), calculated first operational wavelengths (λ2,n), and refractive indices after exposure (nf2,n) for common commercial holographic laser sources using pan-photopolymer recording materials. Refractive index change value equals 0.0024. Grating period ratio: Λ2,n/Λ1,n = 1.
Table 2. Summary of wavelengths (λ1), initial refractive indices (nf1), calculated first operational wavelengths (λ2,n), and refractive indices after exposure (nf2,n) for common commercial holographic laser sources using pan-photopolymer recording materials. Refractive index change value equals 0.0024. Grating period ratio: Λ2,n/Λ1,n = 1.
λ1 (μm)nf1λ2,n (μm)nf2,n
0.4501.50060.4491.4982
0.5321.49370.5311.4913
0.6331.48870.6321.4863
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Zhuang, B.-H.; Hung, S.-C.; Chen, K.-H.; Yeh, C.-H.; Chen, J.-H. Holographic Multi-Notch Filters Recorded with Simultaneous Double-Exposure Contact Mirror-Based Method. Photonics 2024, 11, 977. https://doi.org/10.3390/photonics11100977

AMA Style

Zhuang B-H, Hung S-C, Chen K-H, Yeh C-H, Chen J-H. Holographic Multi-Notch Filters Recorded with Simultaneous Double-Exposure Contact Mirror-Based Method. Photonics. 2024; 11(10):977. https://doi.org/10.3390/photonics11100977

Chicago/Turabian Style

Zhuang, Bing-Han, Sheng-Chun Hung, Kun-Huang Chen, Chien-Hung Yeh, and Jing-Heng Chen. 2024. "Holographic Multi-Notch Filters Recorded with Simultaneous Double-Exposure Contact Mirror-Based Method" Photonics 11, no. 10: 977. https://doi.org/10.3390/photonics11100977

APA Style

Zhuang, B.-H., Hung, S.-C., Chen, K.-H., Yeh, C.-H., & Chen, J.-H. (2024). Holographic Multi-Notch Filters Recorded with Simultaneous Double-Exposure Contact Mirror-Based Method. Photonics, 11(10), 977. https://doi.org/10.3390/photonics11100977

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