Advances in EUV/X-Ray Optics: Science and Applications

Dear Colleagues,

Recent interest in extreme ultraviolet (EUV) and X-ray radiation within the electromagnetic spectrum has significantly increased, highlighting their importance in fundamental research and applications across physics, chemistry, astronomy, life sciences, and technological advancements. The latest generation of large photon sources, such as synchrotron radiation (SR) and X-ray free-electron lasers (XFELs), offers powerful EUV/X-ray light for contemporary scientific and technological applications.

To harness their full potential, it is crucial to transfer photons from the source to the experimental station without compromising their essential characteristics, particularly wavefront and coherence preservation. Recent developments in ultra-intense, highly brilliant SR and XFEL systems focus on achieving 1 nm spatial resolution imaging applications. These demands present significant challenges in optical design and tailoring to ensure accurate photon transport for experiments. Fields such as X-ray astronomy need high-resolution, large-surface-area mirrors.

Optical components, including reflective mirrors, diffraction gratings, zone plates, and multilayer mirrors, must be manufactured with nanometer to sub-nanometer figure and structural accuracy. This necessitates innovative approaches in optics development and metrological techniques to achieve enhanced radiation hardness and precise control over spectral amplitude and phase. While substantial progress has been made in optics, further advancements are on the horizon.

This Special Issue invites contributions exploring the latest advancements in the design, development, fabrication, and application of EUV/X-ray optical elements and systems. Potential topics may include, but are not limited to, the following:

Keywords:

• Mirrors for deflecting, monochromatizing, and collimating beams;
• Diffractive optics for monochromators and spectrometers;
• Optics focused on KB mirrors, reflective lenses, and zone plates;
• The design and fabrication of multilayer optics;
• Metrological techniques.

Dr. Paresh Chandra Pradhan
Dr. Srikanth Panini Singam
Guest Editors

Manuscript Submission Information

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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• mirrors for deflecting, monochromatizing, and collimating beams
• diffractive optics for monochromators and spectrometers
• optics focused on KB mirrors, reflective lenses, and zone plates
• the design and fabrication of multilayer optics
• metrological techniques