Gracia-Abad, R.; Sangiao, S.; Kumar Chaluvadi, S.; Orgiani, P.; Teresa, J.M.D.
Ion-Induced Lateral Damage in the Focused Ion Beam Patterning of Topological Insulator Bi2Se3 Thin Films. Materials 2023, 16, 2244.
https://doi.org/10.3390/ma16062244
AMA Style
Gracia-Abad R, Sangiao S, Kumar Chaluvadi S, Orgiani P, Teresa JMD.
Ion-Induced Lateral Damage in the Focused Ion Beam Patterning of Topological Insulator Bi2Se3 Thin Films. Materials. 2023; 16(6):2244.
https://doi.org/10.3390/ma16062244
Chicago/Turabian Style
Gracia-Abad, Rubén, Soraya Sangiao, Sandeep Kumar Chaluvadi, Pasquale Orgiani, and José MarÃa De Teresa.
2023. "Ion-Induced Lateral Damage in the Focused Ion Beam Patterning of Topological Insulator Bi2Se3 Thin Films" Materials 16, no. 6: 2244.
https://doi.org/10.3390/ma16062244
APA Style
Gracia-Abad, R., Sangiao, S., Kumar Chaluvadi, S., Orgiani, P., & Teresa, J. M. D.
(2023). Ion-Induced Lateral Damage in the Focused Ion Beam Patterning of Topological Insulator Bi2Se3 Thin Films. Materials, 16(6), 2244.
https://doi.org/10.3390/ma16062244