Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds
Abstract
:1. Introduction
2. Results and Discussion
Compound | Ai | Bi | ΔHsub(exp) (T/K) / kJ ∙ mol-1 |
---|---|---|---|
[(η5‑C5H5)2Ru] (1) | 13.0 | 5249.99 | 100.52 (331–346) 98.78a (356–370) |
[(η5‑OC6H9)2Ru] (2) | 13.45 | 5974.61 | 114.39 (360–384) |
[(η5‑C5H5)(η5‑C5H4CH2NMe2)Ru] (3) | 10.80 | 4505.81 | 86.27 (327–351) |
[(η5‑C7H11)2Ru] (4) | 12.54 | 5133.29 | 98.28 (331–360) |
[(η5‑C5H4COCH3)2Ru] (6) | 15.56 | 7310.25 | 139.97 (369–410) |
[(η5‑C5H5)(η5‑C5H4CO(CH2)3COOMe)Ru] (9) | 11.98 | 5974.61 | 114,39 (379–403) |
[(η5‑C5H5)(η5‑C5H4CO(CH2)2COOMe)Ru] (10) | 14.87 | 6938.75 | 132.85 (374–394) |
[(η5‑C5H4SiMe3)2Ru] (11) | 14.24 | 5609.41 | 151.51 (331–346) |
3. Experimental Section
3.1. General Methods
3.2. Thermal Stability Measurements
3.3. Vapor Pressure Measurements
4. Conclusions
Acknowledgements
References and Notes
- Bielawa, H.; Hinrichsen, O.; Birkner, A.; Muhler, M. The ammonia-synthesis catalyst of the next generation: Barium-promoted oxide-supported ruthenium. Angew. Chem. Int. Ed. 2001, 40, 1061–1063. [Google Scholar] [CrossRef]
- Takagi, T.; Oizuki, I.; Kobayashi, I.; Okada, M. RuO2 bottom electrodes for ferroelectric (Pb,La)(Zr,Ti)O3 thin films by metalorganic chemical vapor deposition. Jpn. J. Appl. Phys. 1995, 34, 4104–4107. [Google Scholar] [CrossRef]
- Trent, D.E.; Paris, B.; Kraus, H.H. Vapor deposition of pure ruthenium metal from ruthenocene. Inorg. Chem. 1964, 3, 1057–1058. [Google Scholar] [CrossRef]
- Lai, Y.H.; Chen, Y.L.; Chi, Y.; Liu, C.S.; Carty, A.J.; Peng, S.M.; Lee, G.H. Deposition of Ru and RuO2 thin films employing dicarbonyl bis-diketonate ruthenium complexes as CVD source reagents. J. Mater. Chem. 1999, 13, 1999–2006. [Google Scholar] [CrossRef]
- Shin, W.C.; Yoon, S.G. Characterization of RuO2 Thin films prepared by hot-wall metallorganic chemical vapor deposition. J. Electrochem. Soc. 1997, 144, 1055–1060. [Google Scholar] [CrossRef]
- Park, S.E.; Kim, H.M.; Kim, K.B.; Min, S.H. Metallorganic chemical vapor deposition of Ru and RuO2 using ruthenocene precursor and oxygen gas. J. Electrochem. Soc. 2000, 147, 203–209. [Google Scholar] [CrossRef]
- Hur'yeva, T.; Lisker, M.; Burte, E.P. Ruthenium films deposited by liquid-delivery MOCVD using bis(ethylcyclopentadienyl)ruthenium with toluene as the solvent. Chem. Vapor Deposition 2006, 12, 429–434. [Google Scholar]
- Ganesan, P.G.; Eizenberg, M.; Dornfest, C. Chemical vapor deposited RuOx films: Effect of oxygen flow rate. J. Electrochem. Soc. 2002, 149, G510–G516. [Google Scholar] [CrossRef]
- Matsui, Y.; Hiratami, M.; Nabatame, T.; Shimamoto, Y.; Kimura, S. Growth mechanism of Ru films prepared by chemical vapor deposition using bis(ethylcyclopentadienyl)ruthenium precursor. Electrochem. Solid State Lett. 2001, 4, C9–C12. [Google Scholar] [CrossRef]
- Tian, H.-Y.; Chan, H.-L.-W.; Choy, C.-L.; Choi, J.-W.; No, K.-S. Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)2 precursor. Mater. Chem. Phys. 2005, 93, 142–148. [Google Scholar] [CrossRef]
- Green, M.L.; Gross, M.E.; Papa, L.E.; Schnoes, K.J.; Brasen, D. Chemical vapor deposition of ruthenium and ruthenium dioxide films. J. Electrochem. Soc. 1985, 132, 2677–2685. [Google Scholar] [CrossRef]
- Lee, D.J.; Kang, S.W.; Rhee, S.W. Chemical vapor deposition of ruthenium oxide thin films from Ru(tmhd)3 using direct liquid injection. Thin Solid Films 2002, 413, 237–242. [Google Scholar] [CrossRef]
- Schneider, A.; Popovska, N.; Jipa, I.; Atakan, B.; Siddiqi, M.A.; Siddiqui, R.; Zenneck, U. Minimizing the carbon content of thin ruthenium films by MOCVD precursor complex design and process control. Chem. Vap. Deposition 2007, 13, 389–395. [Google Scholar] [CrossRef]
- Cordes, J.F.; Schreiner, S. Dampfdruckmessungen bei einigen Aromatenkomplexen. Z. Anorg. Allg. Chem. 1959, 299, 87–91. [Google Scholar] [CrossRef]
- Robinovich, I.B.; Nistratov, V.P.; Telnoy, V.I.; Sheiman, M.S. Thermodynamic Properties of Organometallic Compounds. In Thermochemical and Thermodynamic Properties of Organometallic Compounds; Frenkel, M., Ed.; Begell House Inc: New York, NY, USA, 1999; pp. 132–133. [Google Scholar]
- Kawano, K.; Kosuge, H.; Oshima, N.; Funakubo, H. Low-temperature preparation of metallic ruthenium films by MOCVD using bis(2,4-dimethylpentadienyl)ruthenium. Electrochem. Solid-State Lett. 2007, 10, D60–D62. [Google Scholar] [CrossRef]
- Kawano, K.; Kosuge, H.; Oshima, N.; Funakubo, H. Ruthenium and ruthenium oxide film deposition by MOCVD using Ru(DMPD)2. ECS Transactions 2006, 1, 139–144. [Google Scholar]
- Siddiqi, M.A.; Atakan, B. Combined experiments to measure low sublimation pressures and diffusion coefficients of organometallic compounds. Thermochim. Acta 2007, 452, 128–134. [Google Scholar] [CrossRef]
- Trent, D.E.; Paris, B.; Krause, H.H. Vapor deposition of pure ruthenium metal from ruthenocene. Inorg. Chem. 1964, 3, 1057–1058. [Google Scholar]
- Lang, H.; Blau, S.; Rheinwald, G.; Wildermuth, G. Pyrolyse von Übergangsmetallkomplexen: Darstellung von metallcarbiden (MC, M2C) aus metallorganischen verbindungen. J. Organomet. Chem. 1995, 489, C17–C21. [Google Scholar] [CrossRef]
- Lang, H.; Blau, S.; Rheinwald, G. Thermolyseverhalten alkinylsubstituierter cyclopentadienyl-dicarbonyl-eisen-verbindungen. J. Organomet. Chem. 1995, 492, 81–85. [Google Scholar] [CrossRef]
- Lang, H.; Seyferth, D. Pyrolysis of metallocene complexes (C5H4R)2MR2: An organometallic route to metal carbide (MC) materials (M = Ti, Zr, Hf). Appl. Organometal. Chem. 1990, 4, 599–606. [Google Scholar] [CrossRef]
- Siddiqi, M.A.; Siddiqui, R.A.; Atakan, B. Thermal stability, sublimation pressures and diffusion coefficients of some metal acetylacetonates. Surf. Coat. Technol. 2007, 201, 9055–9059. [Google Scholar] [CrossRef]
- Ambrose, D. Vapor Pressure. In Experimental Thermodynamics Volume II; Le Neindre, B., Vodar, B., Eds.; Butterworths: London, UK, 1975; pp. 641–643. [Google Scholar]
- Kündig, E.P.; Monnier, F.R. Efficient synthesis of Tris(acetonitrile)-(η5-cyclopentadienyl)-ruthenium(II) hexafluorophosphate via ruthenocene. Adv. Synth. Catal. 2004, 346, 901–904. [Google Scholar] [CrossRef]
- Schmidt, T.; Goddard, R. Bis[η5-(2,4-dimethyl-1-oxapentadienyl)]ruthenium(II): The first homoleptic open ruthenocenes with non-hydrocarbon ligands. J. Chem. Soc. Chem. Commun. 1991, 1427–1429. [Google Scholar] [CrossRef]
- Beagley, P.; Blackie, M.A.L.; Chibale, K.; Clarkson, C.; Moss, J.R.; Smith, P.J. Synthesis and antimalarial activity in vitro of new ruthenocene-chloroquine analogues. J. Chem. Soc. Dalton Trans. 2002, 4426–4433. [Google Scholar] [CrossRef]
- Stahl, L.; Ernst, R.D. Synthesis and characterization of bis(pentadienyl)ruthenium compounds. Organometallics 1983, 2, 1229–1234. [Google Scholar] [CrossRef]
- Rausch, M.; Fischer, E.O.; Grubert, H. The aromatic reactivity of ferrocene, ruthenocene and osmocene. J. Amer. Chem. Soc. 1960, 82, 76–81. [Google Scholar] [CrossRef]
- Wessler, M.; Schütte, D. Metallocen-Phosphoramidit-Konjugate, Verfahren zu ihrer Herstellung sowie deren Verwendung. Patent WO 97/09338.
- Ryan, M.F.; Siedle, A.; Burk, M.; Richardson, D.E. Parameter scale for substituent effects in cyclopentadienyl complexes based on gas-phase electron-transfer equilibrium studies of ruthenocene derivatives. Organometallics 1992, 11, 4231–4237. [Google Scholar] [CrossRef]
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Siddiqi, M.A.; Siddiqui, R.A.; Atakan, B.; Roth, N.; Lang, H. Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds. Materials 2010, 3, 1172-1185. https://doi.org/10.3390/ma3021172
Siddiqi MA, Siddiqui RA, Atakan B, Roth N, Lang H. Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds. Materials. 2010; 3(2):1172-1185. https://doi.org/10.3390/ma3021172
Chicago/Turabian StyleSiddiqi, M. Aslam, Rehan A. Siddiqui, Burak Atakan, Nina Roth, and Heinrich Lang. 2010. "Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds" Materials 3, no. 2: 1172-1185. https://doi.org/10.3390/ma3021172
APA StyleSiddiqi, M. A., Siddiqui, R. A., Atakan, B., Roth, N., & Lang, H. (2010). Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds. Materials, 3(2), 1172-1185. https://doi.org/10.3390/ma3021172