Dunkel, C.; Von Graberg, T.; Smarsly, B.M.; Oekermann, T.; Wark, M.
Limits of ZnO Electrodeposition in Mesoporous Tin Doped Indium Oxide Films in View of Application in Dye-Sensitized Solar Cells. Materials 2014, 7, 3291-3304.
https://doi.org/10.3390/ma7043291
AMA Style
Dunkel C, Von Graberg T, Smarsly BM, Oekermann T, Wark M.
Limits of ZnO Electrodeposition in Mesoporous Tin Doped Indium Oxide Films in View of Application in Dye-Sensitized Solar Cells. Materials. 2014; 7(4):3291-3304.
https://doi.org/10.3390/ma7043291
Chicago/Turabian Style
Dunkel, Christian, Till Von Graberg, Bernd M. Smarsly, Torsten Oekermann, and Michael Wark.
2014. "Limits of ZnO Electrodeposition in Mesoporous Tin Doped Indium Oxide Films in View of Application in Dye-Sensitized Solar Cells" Materials 7, no. 4: 3291-3304.
https://doi.org/10.3390/ma7043291
APA Style
Dunkel, C., Von Graberg, T., Smarsly, B. M., Oekermann, T., & Wark, M.
(2014). Limits of ZnO Electrodeposition in Mesoporous Tin Doped Indium Oxide Films in View of Application in Dye-Sensitized Solar Cells. Materials, 7(4), 3291-3304.
https://doi.org/10.3390/ma7043291