Gwamuri, J.; Marikkannan, M.; Mayandi, J.; Bowen, P.K.; Pearce, J.M.
Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices. Materials 2016, 9, 63.
https://doi.org/10.3390/ma9010063
AMA Style
Gwamuri J, Marikkannan M, Mayandi J, Bowen PK, Pearce JM.
Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices. Materials. 2016; 9(1):63.
https://doi.org/10.3390/ma9010063
Chicago/Turabian Style
Gwamuri, Jephias, Murugesan Marikkannan, Jeyanthinath Mayandi, Patrick K. Bowen, and Joshua M. Pearce.
2016. "Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices" Materials 9, no. 1: 63.
https://doi.org/10.3390/ma9010063
APA Style
Gwamuri, J., Marikkannan, M., Mayandi, J., Bowen, P. K., & Pearce, J. M.
(2016). Influence of Oxygen Concentration on the Performance of Ultra-Thin RF Magnetron Sputter Deposited Indium Tin Oxide Films as a Top Electrode for Photovoltaic Devices. Materials, 9(1), 63.
https://doi.org/10.3390/ma9010063