Xu, L.; Wang, L.; Chen, H.; Wang, X.; Chen, F.; Lyu, B.; Hang, W.; Zhao, W.; Yuan, J.
Effects of pH Values and H2O2 Concentrations on the Chemical Enhanced Shear Dilatancy Polishing of Tungsten. Micromachines 2022, 13, 762.
https://doi.org/10.3390/mi13050762
AMA Style
Xu L, Wang L, Chen H, Wang X, Chen F, Lyu B, Hang W, Zhao W, Yuan J.
Effects of pH Values and H2O2 Concentrations on the Chemical Enhanced Shear Dilatancy Polishing of Tungsten. Micromachines. 2022; 13(5):762.
https://doi.org/10.3390/mi13050762
Chicago/Turabian Style
Xu, Liang, Lin Wang, Hongyu Chen, Xu Wang, Fangyuan Chen, Binghai Lyu, Wei Hang, Wenhong Zhao, and Julong Yuan.
2022. "Effects of pH Values and H2O2 Concentrations on the Chemical Enhanced Shear Dilatancy Polishing of Tungsten" Micromachines 13, no. 5: 762.
https://doi.org/10.3390/mi13050762
APA Style
Xu, L., Wang, L., Chen, H., Wang, X., Chen, F., Lyu, B., Hang, W., Zhao, W., & Yuan, J.
(2022). Effects of pH Values and H2O2 Concentrations on the Chemical Enhanced Shear Dilatancy Polishing of Tungsten. Micromachines, 13(5), 762.
https://doi.org/10.3390/mi13050762