Article Versions Notes

Xi Y, Qin X, Li W, Luo X, Zhang J, Liu W, Yang P. Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO₂ Thin Films Grown by DC Reactive Magnetron Sputtering. Micromachines. 2023; 14(9):1800. https://doi.org/10.3390/mi14091800

Xi, Yingxue, Xinghui Qin, Wantong Li, Xi Luo, Jin Zhang, Weiguo Liu, and Pengfei Yang. 2023. "Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO₂ Thin Films Grown by DC Reactive Magnetron Sputtering" Micromachines 14, no. 9: 1800. https://doi.org/10.3390/mi14091800

Xi, Y., Qin, X., Li, W., Luo, X., Zhang, J., Liu, W., & Yang, P. (2023). Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO₂ Thin Films Grown by DC Reactive Magnetron Sputtering. Micromachines, 14(9), 1800. https://doi.org/10.3390/mi14091800