Li, X.; Zhang, J.; Duan, Y.; Liu, N.; Jiang, J.; Ma, R.; Xi, H.; Li, X.
Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si3N4 Ceramics. Appl. Sci. 2020, 10, 6438.
https://doi.org/10.3390/app10186438
AMA Style
Li X, Zhang J, Duan Y, Liu N, Jiang J, Ma R, Xi H, Li X.
Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si3N4 Ceramics. Applied Sciences. 2020; 10(18):6438.
https://doi.org/10.3390/app10186438
Chicago/Turabian Style
Li, Xingbang, Jingxian Zhang, Yusen Duan, Ning Liu, Jinhua Jiang, Ruixin Ma, Hongan Xi, and Xiaoguang Li.
2020. "Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si3N4 Ceramics" Applied Sciences 10, no. 18: 6438.
https://doi.org/10.3390/app10186438
APA Style
Li, X., Zhang, J., Duan, Y., Liu, N., Jiang, J., Ma, R., Xi, H., & Li, X.
(2020). Rheology and Curability Characterization of Photosensitive Slurries for 3D Printing of Si3N4 Ceramics. Applied Sciences, 10(18), 6438.
https://doi.org/10.3390/app10186438