Panaitescu, A.-M.; Antohe, I.; Locovei, C.; Iftimie, S.; Antohe, Åž.; Piraux, L.; Suchea, M.P.; Antohe, V.-A.
Effect of the Cadmium Telluride Deposition Method on the Covering Degree of Electrodes Based on Copper Nanowire Arrays. Appl. Sci. 2022, 12, 7808.
https://doi.org/10.3390/app12157808
AMA Style
Panaitescu A-M, Antohe I, Locovei C, Iftimie S, Antohe Åž, Piraux L, Suchea MP, Antohe V-A.
Effect of the Cadmium Telluride Deposition Method on the Covering Degree of Electrodes Based on Copper Nanowire Arrays. Applied Sciences. 2022; 12(15):7808.
https://doi.org/10.3390/app12157808
Chicago/Turabian Style
Panaitescu, Ana-Maria, Iulia Antohe, Claudiu Locovei, Sorina Iftimie, Åžtefan Antohe, Luc Piraux, Mirela Petruta Suchea, and Vlad-Andrei Antohe.
2022. "Effect of the Cadmium Telluride Deposition Method on the Covering Degree of Electrodes Based on Copper Nanowire Arrays" Applied Sciences 12, no. 15: 7808.
https://doi.org/10.3390/app12157808
APA Style
Panaitescu, A. -M., Antohe, I., Locovei, C., Iftimie, S., Antohe, Åž., Piraux, L., Suchea, M. P., & Antohe, V. -A.
(2022). Effect of the Cadmium Telluride Deposition Method on the Covering Degree of Electrodes Based on Copper Nanowire Arrays. Applied Sciences, 12(15), 7808.
https://doi.org/10.3390/app12157808