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Journal: Appl. Sci., 2019
Volume: 9
Number: 3163

Article: Comparison of Various Factors Affected TID Tolerance in FinFET and Nanowire FET
Authors: by Hyeonjae Won, Ilsik Ham, Youngseok Jeong and Myounggon Kang
Link: https://www.mdpi.com/2076-3417/9/15/3163

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