Rubner, J.; Skribbe, S.; Roth, H.; Kleines, L.; Dahlmann, R.; Wessling, M.
On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD). Membranes 2022, 12, 994.
https://doi.org/10.3390/membranes12100994
AMA Style
Rubner J, Skribbe S, Roth H, Kleines L, Dahlmann R, Wessling M.
On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD). Membranes. 2022; 12(10):994.
https://doi.org/10.3390/membranes12100994
Chicago/Turabian Style
Rubner, Jens, Soukaina Skribbe, Hannah Roth, Lara Kleines, Rainer Dahlmann, and Matthias Wessling.
2022. "On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)" Membranes 12, no. 10: 994.
https://doi.org/10.3390/membranes12100994
APA Style
Rubner, J., Skribbe, S., Roth, H., Kleines, L., Dahlmann, R., & Wessling, M.
(2022). On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD). Membranes, 12(10), 994.
https://doi.org/10.3390/membranes12100994