Article Versions Notes

Huang S, Ng ZK, Li H, Chaturvedi A, Lim JWM, Tay RY, Teo EHT, Xu S, Ostrikov K, Tsang SH. Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen. Nanomaterials. 2022; 12(21):3876. https://doi.org/10.3390/nano12213876

Huang, Shiyong, Zhi Kai Ng, Hongling Li, Apoorva Chaturvedi, Jian Wei Mark Lim, Roland Yingjie Tay, Edwin Hang Tong Teo, Shuyan Xu, Kostya (Ken) Ostrikov, and Siu Hon Tsang. 2022. "Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen" Nanomaterials 12, no. 21: 3876. https://doi.org/10.3390/nano12213876

Huang, S., Ng, Z. K., Li, H., Chaturvedi, A., Lim, J. W. M., Tay, R. Y., Teo, E. H. T., Xu, S., Ostrikov, K., & Tsang, S. H. (2022). Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen. Nanomaterials, 12(21), 3876. https://doi.org/10.3390/nano12213876