Lee, T.-Y.; Hsieh, T.-H.; Miao, W.-C.; James Singh, K.; Li, Y.; Tu, C.-C.; Chen, F.-C.; Lu, W.-C.; Kuo, H.-C.
High-Reliability Perovskite Quantum Dots Using Atomic Layer Deposition Passivation for Novel Photonic Applications. Nanomaterials 2022, 12, 4140.
https://doi.org/10.3390/nano12234140
AMA Style
Lee T-Y, Hsieh T-H, Miao W-C, James Singh K, Li Y, Tu C-C, Chen F-C, Lu W-C, Kuo H-C.
High-Reliability Perovskite Quantum Dots Using Atomic Layer Deposition Passivation for Novel Photonic Applications. Nanomaterials. 2022; 12(23):4140.
https://doi.org/10.3390/nano12234140
Chicago/Turabian Style
Lee, Tzu-Yi, Tsau-Hua Hsieh, Wen-Chien Miao, Konthoujam James Singh, Yiming Li, Chang-Ching Tu, Fang-Chung Chen, Wen-Chung Lu, and Hao-Chung Kuo.
2022. "High-Reliability Perovskite Quantum Dots Using Atomic Layer Deposition Passivation for Novel Photonic Applications" Nanomaterials 12, no. 23: 4140.
https://doi.org/10.3390/nano12234140
APA Style
Lee, T. -Y., Hsieh, T. -H., Miao, W. -C., James Singh, K., Li, Y., Tu, C. -C., Chen, F. -C., Lu, W. -C., & Kuo, H. -C.
(2022). High-Reliability Perovskite Quantum Dots Using Atomic Layer Deposition Passivation for Novel Photonic Applications. Nanomaterials, 12(23), 4140.
https://doi.org/10.3390/nano12234140
