Yin, Y.; Liu, R.; Zhao, H.; Fan, S.; Zhang, J.; Li, S.; Sun, Q.; Yang, H.
High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy. Nanomaterials 2024, 14, 1459.
https://doi.org/10.3390/nano14171459
AMA Style
Yin Y, Liu R, Zhao H, Fan S, Zhang J, Li S, Sun Q, Yang H.
High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy. Nanomaterials. 2024; 14(17):1459.
https://doi.org/10.3390/nano14171459
Chicago/Turabian Style
Yin, Yuhao, Rong Liu, Haiyang Zhao, Shizhao Fan, Jianming Zhang, Shun Li, Qian Sun, and Hui Yang.
2024. "High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy" Nanomaterials 14, no. 17: 1459.
https://doi.org/10.3390/nano14171459
APA Style
Yin, Y., Liu, R., Zhao, H., Fan, S., Zhang, J., Li, S., Sun, Q., & Yang, H.
(2024). High-Quality Single Crystalline Sc0.37Al0.63N Thin Films Enabled by Precise Tuning of III/N Atomic Flux Ratio during Molecular Beam Epitaxy. Nanomaterials, 14(17), 1459.
https://doi.org/10.3390/nano14171459