Borah, D.; Cummins, C.; Rasappa, S.; Senthamaraikannan, R.; Salaun, M.; Zelsmann, M.; Liontos, G.; Ntetsikas, K.; Avgeropoulos, A.; Morris, M.A.
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography. Nanomaterials 2018, 8, 32.
https://doi.org/10.3390/nano8010032
AMA Style
Borah D, Cummins C, Rasappa S, Senthamaraikannan R, Salaun M, Zelsmann M, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA.
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography. Nanomaterials. 2018; 8(1):32.
https://doi.org/10.3390/nano8010032
Chicago/Turabian Style
Borah, Dipu, Cian Cummins, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Mathieu Salaun, Marc Zelsmann, George Liontos, Konstantinos Ntetsikas, Apostolos Avgeropoulos, and Michael A. Morris.
2018. "Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography" Nanomaterials 8, no. 1: 32.
https://doi.org/10.3390/nano8010032
APA Style
Borah, D., Cummins, C., Rasappa, S., Senthamaraikannan, R., Salaun, M., Zelsmann, M., Liontos, G., Ntetsikas, K., Avgeropoulos, A., & Morris, M. A.
(2018). Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography. Nanomaterials, 8(1), 32.
https://doi.org/10.3390/nano8010032