Wiatrowski, A.; Mazur, M.; Obstarczyk, A.; Wojcieszak, D.; Kaczmarek, D.; Morgiel, J.; Gibson, D.
Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings 2018, 8, 412.
https://doi.org/10.3390/coatings8110412
AMA Style
Wiatrowski A, Mazur M, Obstarczyk A, Wojcieszak D, Kaczmarek D, Morgiel J, Gibson D.
Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings. 2018; 8(11):412.
https://doi.org/10.3390/coatings8110412
Chicago/Turabian Style
Wiatrowski, Artur, Michał Mazur, Agata Obstarczyk, Damian Wojcieszak, Danuta Kaczmarek, Jerzy Morgiel, and Des Gibson.
2018. "Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow" Coatings 8, no. 11: 412.
https://doi.org/10.3390/coatings8110412
APA Style
Wiatrowski, A., Mazur, M., Obstarczyk, A., Wojcieszak, D., Kaczmarek, D., Morgiel, J., & Gibson, D.
(2018). Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings, 8(11), 412.
https://doi.org/10.3390/coatings8110412