Knabl, F.; Kostoglou, N.; Gupta, R.K.; Tarat, A.; Hinder, S.; Baker, M.; Rebholz, C.; Mitterer, C.
Plasma-Treated Cobalt-Doped Nanoporous Graphene for Advanced Electrochemical Applications. C 2024, 10, 31.
https://doi.org/10.3390/c10020031
AMA Style
Knabl F, Kostoglou N, Gupta RK, Tarat A, Hinder S, Baker M, Rebholz C, Mitterer C.
Plasma-Treated Cobalt-Doped Nanoporous Graphene for Advanced Electrochemical Applications. C. 2024; 10(2):31.
https://doi.org/10.3390/c10020031
Chicago/Turabian Style
Knabl, Florian, Nikolaos Kostoglou, Ram K. Gupta, Afshin Tarat, Steven Hinder, Mark Baker, Claus Rebholz, and Christian Mitterer.
2024. "Plasma-Treated Cobalt-Doped Nanoporous Graphene for Advanced Electrochemical Applications" C 10, no. 2: 31.
https://doi.org/10.3390/c10020031
APA Style
Knabl, F., Kostoglou, N., Gupta, R. K., Tarat, A., Hinder, S., Baker, M., Rebholz, C., & Mitterer, C.
(2024). Plasma-Treated Cobalt-Doped Nanoporous Graphene for Advanced Electrochemical Applications. C, 10(2), 31.
https://doi.org/10.3390/c10020031