Recent Advances in Functional Metal Oxide Thin Films
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".
Deadline for manuscript submissions: 10 August 2025 | Viewed by 2517
Special Issue Editors
Interests: physical vapor deposition; reactive magnetron sputtering deposition; ferroelectrics; multiferroics; X-ray spectroscopy; crystallography; plasma-assisted deposition; dielectric properties of materials; optic properties; conductive optical transparent materials; magnetic materials for spintronics
Interests: physical vapor deposition; reactive magnetron sputtering deposition; ferroelectrics; multiferroics; electro-optic thin films; crystallography; Raman scattering spectroscopy; graphene; boron nitride films; dielectric properties of materials; optic properties
Special Issue Information
Dear Colleagues,
Oxide thin films have applications in a variety of energy and information technologies, including photovoltaics, thermoelectrics, piezoelectrics, magnetoelectrics, dielectrics, electron and ion conductors, and resistive switching. Single thin films or more complex multilayer systems are used; each of these technologies requires detailed knowledge of the properties of the oxides. Functional oxides are the most attractive materials with varying degrees of structural complexity, which continue to stimulate many research projects in the fields of physics and materials science. Oxide heterostructures and thin films have been studied and used for many years. These oxides include many different structures, such as perovskite, wurtzite, zirconium, corundum, fluorite, spinel, etc. In this group of materials, thin oxide film materials exhibit a variety of remarkable properties, such as high-temperature superconductivity, large magnetoresistance, ionic conductivity, thermoelectricity, ferromagnetism, ferroelectricity, and multiferroicity. Therefore, we believe that the exchange of information between different and even complementary research communities can be very useful to better understand the essential aspects that need to be addressed to improve the functional properties of oxide materials. The overall goal of this collection of papers is to stimulate a broad discussion of advances in thin film materials physics and chemistry.
This Special Issue will serve as a forum for papers on the following concepts:
- Theoretical research and knowledge of the growing mechanisms of oxide thin films.
- Experimental investigation research and new ideas in deposition technics of oxide thin films.
- Investigation of thin films’ functional properties’ dependence on synthesis parameters.
- Methods of improvement of the functional properties of thin film oxide materials.
- Novel investigation technics of oxide thin films’ functional properties.
Dr. Aleksandras Iljinas
Dr. Vytautas Stankus
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- functional oxide thin films
- oxide heterostructures
- nanostructures
- deposition technics of oxide thin films
- multiferroics
- growth
- characterization
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