Advanced Optical Films and Coatings

A topical collection in Coatings (ISSN 2079-6412). This collection belongs to the section "Thin Films".

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Collection Editor
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany
Interests: characterization of thin solid films; coating design; spectrophotometry; optical constants; oxide and fluoride coatings; metal and metal- containing films; heterogeneous coatings; coating deposition; process control
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Topical Collection Information

Dear Colleagues,

Optical films and coatings are an essential part of any optical system. They are used to tailor the optical and non-optical properties of surfaces. Thereby, accurate knowledge of material properties is essential, and so is the subject of optical coatings’ characterization. Typically, single-layer coatings on a transparent substrate are used for characterizations. For advanced coatings, more complex systems are often required for a reliable characterization of underlying building blocks.

When designing optical coatings, the geometric arrangement of materials is determined based on the known optical constants. For conventional coatings, layer thicknesses and their sequences and numbers are determined. With layers build from mixed materials, the possible variety of parameters (e.g., volume fill factor and the shape and size of the inclusions) is greater and can be spatially varied. Therefore, the design process of such advanced coatings is more demanding.

This Collection, titled “Advanced Optical Films and Coatings”, welcomes research papers focusing on the design and characterization of all types of thin films with optical application backgrounds in spectral ranges, from the microwave to the vacuum ultraviolet spectrum. Authors are particularly encouraged to submit papers on the following areas:

  • Coating characterization.
  • Coating design and computational manufacturing.
  • Pure materials and mixtures of oxides, fluorides, metals, or semiconductors.
  • Micro- and nanostructured coatings.
  • Non-linear properties.

Dr. Steffen Wilbrandt
Collection Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the collection website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • coating characterization
  • thin solid films
  • optical materials
  • nanostructure
  • coating design
  • computational manufacturing
  • oxides
  • fluorides
  • metals
  • spectrophotometry

Published Papers (1 paper)

2024

22 pages, 2231 KiB  
Article
Vacuum Ultraviolet Spectroscopic Analysis of Structural Phases in TiO2 Sol–Gel Thin Films
by Helena Cristina Vasconcelos, Maria Meirelles, Reşit Özmenteş and Abdulkadir Korkut
Coatings 2025, 15(1), 19; https://doi.org/10.3390/coatings15010019 - 28 Dec 2024
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Abstract
This study investigates the structural and electronic transitions of sol–gel derived titanium dioxide (TiO2) thin films using vacuum ultraviolet (VUV) spectroscopy, to elucidate the impact of annealing-induced phase evolution. As the annealing temperature increased from 400 °C to 800 °C, the [...] Read more.
This study investigates the structural and electronic transitions of sol–gel derived titanium dioxide (TiO2) thin films using vacuum ultraviolet (VUV) spectroscopy, to elucidate the impact of annealing-induced phase evolution. As the annealing temperature increased from 400 °C to 800 °C, the films transitioned from amorphous to anatase, mixed anatase–rutile, and finally rutile phases. VUV spectroscopy revealed distinct absorption features: a high-energy σ → π* transition below 150 nm, associated with bonding to antibonding orbital excitations, and lower-energy absorption bands in the range 175–180 nm and near 280 nm, attributed to π → π* and t2g(π) → t*2g(π*) transitions, respectively. These spectral features highlight the material’s intrinsic electronic states and defect-related transitions. A slight redshift of the absorption band from 176 nm to 177 nm with annealing reflects bandgap narrowing, attributed to increased rutile content, crystallite growth, and defect-induced effects. Broadening and additional absorption features around 280 nm were attributed to oxygen vacancies and reduced titanium oxidation states (Ti3⁺), as corroborated by X-ray photoelectron spectroscopy (XPS). XPS further confirmed the presence of Ti3⁺ species and oxygen vacancies, providing complementary evidence of defect-mediated transitions observed in the VUV spectra. While complementary techniques such as X-ray diffraction (XRD) and Fourier Transform Infrared Spectroscopy (FTIR) confirmed phase transitions and the reduction of hydroxyl groups, respectively, VUV spectroscopy uniquely captured the dynamic interplay between structural defects, phase evolution, and optical properties. This study underscores the utility of VUV spectroscopy as a powerful tool for probing the electronic structure of TiO2 films, offering insights critical for tailoring their functional properties in advanced applications. Full article
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