Micro-Optics Devices

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "A:Physics".

Deadline for manuscript submissions: closed (25 May 2023) | Viewed by 9134

Special Issue Editor


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Guest Editor

Special Issue Information

Dear Colleagues,

Due to the remarkable advances of micro-optics devices in design, manufacturing process, and material, the performance of micro-optical-related devices has achieved significant improvement. These micro-optical devices have recently attracted a great deal of attention and played crucial roles in a variety of fields, such as in energy, sensors, green engineering, displays, 3C consumer electronics, semiconductor, biomedical applications, etc. The scope of this Special Issue, “Micro-Optics Devices”, can cover the various aspects of the design, manufacture, and application of micro-optics or optical-related sensing device studies, as well as their latest development. We sincerely invite you to contribute your original papers to this Special Issue. The topics of interest include but are not limited to:

  • Optical fiber sensors;
  • Optical thin film devices;
  • Modeling and design of micro-optics lenses;
  • Optical-related and micro-optical sensors;
  • Nanostructured micro-optical devices;
  • Novel optical fiber sensors and their applications;
  • Manufacture of micro-optics devices.

Prof. Dr. Chuen-Lin Tien
Guest Editor

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Keywords

  • micro-optics lenses
  • optical fiber sensor
  • thin film device

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Published Papers (3 papers)

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Research

14 pages, 6592 KiB  
Article
Optical Design of a Miniaturized 10× Periscope Zoom Lens for Smartphones
by Wen-Shing Sun, Yi-Hong Liu and Chuen-Lin Tien
Micromachines 2023, 14(6), 1272; https://doi.org/10.3390/mi14061272 - 20 Jun 2023
Viewed by 3938
Abstract
The size of the optical zoom system is important in smartphone camera design, especially as it governs the thickness of the smartphone. We present the optical design of a miniaturized 10× periscope zoom lens for smartphones. To achieve the desired level of miniaturization, [...] Read more.
The size of the optical zoom system is important in smartphone camera design, especially as it governs the thickness of the smartphone. We present the optical design of a miniaturized 10× periscope zoom lens for smartphones. To achieve the desired level of miniaturization, the conventional zoom lens can be replaced with a periscope zoom lens. In addition to this change in the optical design, the quality of the optical glass, which also affects the performance of the lens, must be considered. With advancements in the optical glass manufacturing process, aspheric lenses are becoming more widely used. In this study, aspheric lenses are incorporated into a design for a 10× optical zoom lens with a lens thickness of less than 6.5 mm and an eight-megapixel image sensor. Furthermore, tolerance analysis is carried out to prove its manufacturability. Full article
(This article belongs to the Special Issue Micro-Optics Devices)
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15 pages, 2928 KiB  
Article
Electrochemically Deposited MoS2 and MnS Multilayers on Nickel Substrates in Inverse Opal Structure as Supercapacitor Microelectrodes
by Sheng-Kuei Chiu, Po-Yan Chen and Rong-Fuh Louh
Micromachines 2023, 14(2), 361; https://doi.org/10.3390/mi14020361 - 31 Jan 2023
Cited by 2 | Viewed by 2154
Abstract
High-dispersion polystyrene (PS) microspheres with monodispersity were successfully synthesized by the non-emulsification polymerization method, and three-dimensional (3D) photonic crystals of PS microspheres were fabricated by electrophoretic self-assembly (EPSA). The metal nickel inverse opal structure (IOS) photonic crystal, of which the structural thickness can [...] Read more.
High-dispersion polystyrene (PS) microspheres with monodispersity were successfully synthesized by the non-emulsification polymerization method, and three-dimensional (3D) photonic crystals of PS microspheres were fabricated by electrophoretic self-assembly (EPSA). The metal nickel inverse opal structure (IOS) photonic crystal, of which the structural thickness can be freely adjusted via electrochemical deposition (ECD), and subsequently, MnS/MoS2/Ni-IOS specimens were also prepared by ECD. Excellent specific capacitance values (1880 F/g) were obtained at a charge current density of 5 A/g. The samples in this experiment were tested for 2000 cycles of cycle life and still retained a reasonably good level of 76.6% of their initial capacitance value. In this study, the inverse opal structure photonic crystal substrate was used as the starting point, and then the microelectrode material for the MnS/MoS2/Ni-IOS supercapacitor was synthesized. Our findings show that the MnS/MoS2/Ni-IOS microelectrode makes a viable technical contribution to the design and fabrication of high-performance supercapacitors. Full article
(This article belongs to the Special Issue Micro-Optics Devices)
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12 pages, 3235 KiB  
Article
Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method
by Shih-Chin Lin, Ching-Chiun Wang, Chuen-Lin Tien, Fu-Ching Tung, Hsuan-Fu Wang and Shih-Hsiang Lai
Micromachines 2023, 14(2), 279; https://doi.org/10.3390/mi14020279 - 21 Jan 2023
Cited by 5 | Viewed by 2466
Abstract
This study demonstrates the low-temperature (<100 °C) process for growing a thin silica buffer layer and aluminum oxide by atomic layer deposition (ALD) in the same reaction chamber. Heterogeneous multilayer thin films are prepared by a dual-mode equipment based on atomic layer deposition [...] Read more.
This study demonstrates the low-temperature (<100 °C) process for growing a thin silica buffer layer and aluminum oxide by atomic layer deposition (ALD) in the same reaction chamber. Heterogeneous multilayer thin films are prepared by a dual-mode equipment based on atomic layer deposition and plasma-enhanced chemical vapor deposition (PECVD) techniques. The pulse discrete feeding method (DFM) was used to divide the precursor purging steps into smaller intervals and generate discrete feeds, which improved the saturated distribution of gas precursors, film density and deposition selectivity. The experimental results show that the process method produces a uniform microstructure and that the best film uniformity is ±2.3% and growth rate is 0.69 Å/cycle. The thickness of aluminum oxide film has a linear relationship with the cyclic growth number from 360 to 1800 cycles. Meanwhile, the structural and mechanical stress properties of aluminum oxide thin films were also verified to meet the requirements of advanced thin-film devices. Full article
(This article belongs to the Special Issue Micro-Optics Devices)
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