Next-Generation Lithography for Optical Device Applications
A special issue of Nanomanufacturing (ISSN 2673-687X).
Deadline for manuscript submissions: closed (30 September 2024) | Viewed by 693
Special Issue Editors
Interests: phase-change materials; optics; nanophotonics; microelectronics; nano-device fabrication; optical simulation; CMOS; LiDAR; 3D printing
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
We are inviting submissions to a Special Issue of the journal Nanomanufacturing on the subject area of “Next-Generation Lithography for Optical Device Applications”. Lithography is the key enabler for the nanoscale optical device manufacturing industry. The continuous, rapid shrinking of the feature size on the wafer requested by the industry urges researchers to find alternative patterning methods as conventional photolithography has its intrinsic resolution and efficiency limits. Over the last few years, considerable progress has been made in exploring new techniques for optical device manufacturing, such as nanoimprint, direct-write lithography, and other new lithography techniques. Our future progress in optical device scaling and yield improvement depends on the continued progress in lithography capability. Thus, this Special Issue is intended to provide a forum for academic researchers and industry professionals to exchange their recent works on their technological advancements in this fast-developing technique for optical devices.
Dr. Pengfei Guo
Dr. Pavana Siddhartha Kollipara
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomanufacturing is an international peer-reviewed open access quarterly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1000 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- photolithography
- nanoimprint
- e-beam lithography
- photoresist
- compound semiconductor substrates
- II–VI
- III–V materials
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