Optical Precision Manufacturing and Testing: Technologies and Trends

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Optoelectronics and Optical Materials".

Deadline for manuscript submissions: 20 March 2025 | Viewed by 2908

Special Issue Editor


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Guest Editor
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, China
Interests: optical high precision manufacturing and testing; optical measurement and analysis; optical components defect detection and evaluation
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Special Issue Information

Dear Colleagues,

Advanced optical manufacturing technology is the key technology in the fields of space remote sensing, space situational awareness and deep space exploration—all areas of study related to national security, national defense construction and national economy. In recent years, the scope of research in the field of technology has been continuously expanding, and it is developing in the direction of higher accuracy, higher efficiency, greater complexity and speed, and lower cost. This Special Issue aims to reflect the latest research achievements and development trends of optical high-precision manufacturing and testing, optical components defect detection and evaluate, etc. In this Special Issue, original research articles and reviews are welcome. Research areas may include (but is not limited to) the following areas:

  • Precision Machining Technology for Optical Components
  • High-Precision Testing Technology for Optical Components
  • Precision Machining and Testing Technology for Special Optical Parts
  • Advanced Optical Manufacturing Processes and Equipment
  • Measurement Methods for Geometric Parameters and Physical Characteristics of Optical Components
  • Detection and Control Technology for Surface and Subsurface Defects in Optical Components

We look forward to receiving your contributions.

Prof. Dr. Xiaokun Wang
Guest Editor

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Keywords

  • optical high-precision manufacturing and testing
  • optical instruments
  • optical system
  • surface defect detection and evaluation
  • subsurface defect detection

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Published Papers (3 papers)

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Research

11 pages, 2536 KiB  
Article
Calculation of Tool Offset and Tool Radius Errors Based on On-Machine Measurement and Least Squares Method in Ultra-Precision Diamond Turning
by Yao Peng, Han Ding, Dong Zhang and Miao Luo
Photonics 2024, 11(11), 1022; https://doi.org/10.3390/photonics11111022 - 30 Oct 2024
Viewed by 466
Abstract
Metal mirrors will be widely used in the coming decades. Therefore, as one of the enabling technologies for metal optical freeform surface manufacturing, ultra-precision (UP) diamond turning error compensation has become a research hotspot. However, for the tool offset error and tool radius [...] Read more.
Metal mirrors will be widely used in the coming decades. Therefore, as one of the enabling technologies for metal optical freeform surface manufacturing, ultra-precision (UP) diamond turning error compensation has become a research hotspot. However, for the tool offset error and tool radius error, which are the main errors in UP diamond turning, no precise and efficient calculation method has been found in the literature. In this study, a more precise and efficient algorithm was developed and validated in three ways using on-machine measurement data and profilometer measurement data. After one compensation, the tool offset error can be reduced to below 0.1 μm, and the tool radius error can be reduced to below 1 micrometer, which will significantly improve the UP turning accuracy and efficiency of optical parts. Full article
(This article belongs to the Special Issue Optical Precision Manufacturing and Testing: Technologies and Trends)
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12 pages, 12643 KiB  
Communication
Power Testing of Aspheric Lenses Based on Transmission Phase Deflectometric Method
by Qiong Wu, Xiaokun Wang, Shuangshuang Zhang, Wenhan Li, Yingjing Zhao, Chengchen Zhou, Donglin Xue and Xuejun Zhang
Photonics 2024, 11(8), 756; https://doi.org/10.3390/photonics11080756 - 13 Aug 2024
Viewed by 854
Abstract
Traditional methods for testing aspheric optical lenses struggle to achieve point-by-point testing across the full aperture of the lens. To facilitate the full-aperture, high-precision, and rapid testing of aspheric optical lenses, a power testing method of lenses based on the transmission phase deflectometric [...] Read more.
Traditional methods for testing aspheric optical lenses struggle to achieve point-by-point testing across the full aperture of the lens. To facilitate the full-aperture, high-precision, and rapid testing of aspheric optical lenses, a power testing method of lenses based on the transmission phase deflectometric technique was employed. This method determines the phase deviation of light caused by the lens, thereby fitting the transmission wavefront and quickly detecting the power distribution information of the lens. This paper constructs a power testing model based on the phase deflectometric technique, proposes a calibration method that combines DLT (direct linear transformation) and pinhole models to reduce system errors, and combines phase extraction and wavefront fitting for experimental verification. The experimental results are compared with those obtained from the commercial visual lens mapper (VM-2000). The central errors of spherical power and cylindrical power are 1% and 0.7%, respectively. This provides a reliable method for the full-aperture, high-precision, and rapid testing of aspheric optical lenses. Full article
(This article belongs to the Special Issue Optical Precision Manufacturing and Testing: Technologies and Trends)
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9 pages, 2616 KiB  
Article
A Study on Length Traceability and Diffraction Efficiency of Chromium Gratings
by Lihua Lei, Lijie Liang, Liqin Liu, Yaoqiong Shen, Yuqing Guan, Yujie Zhang, Wenzhe Zou, Chuangwei Guo and Yunxia Fu
Photonics 2024, 11(3), 233; https://doi.org/10.3390/photonics11030233 - 4 Mar 2024
Viewed by 1115
Abstract
Measurement traceability is a prerequisite for achieving accurate and reliable results as well as technical standardization. The period of Chromium (Cr) gratings fabricated by atomic lithography can be directly traced back to natural constants. Applying the Cr grating to grating interferometry can achieve [...] Read more.
Measurement traceability is a prerequisite for achieving accurate and reliable results as well as technical standardization. The period of Chromium (Cr) gratings fabricated by atomic lithography can be directly traced back to natural constants. Applying the Cr grating to grating interferometry can achieve nanometer measurement traceability. This research aims to analyze the diffraction efficiency characteristics of self-traceable Cr gratings to provide a theoretical basis for the fabrication and application of Cr gratings. In this regard, we establish the theoretical model of the laser beam incident angle and grating diffraction efficiency using the rigorous coupled-wave method. Then, we analyze the influence of the laser beam incident angle on grating diffraction efficiency by simulation, verify the accuracy of the theoretical model, and finally build a measurement system for grating diffraction efficiency. Through experiments, we find that the diffraction efficiency of the grating shows a rapid increase to reach a stable maximum value followed by a decrease, when a laser beam with a wavelength of 405 nm is incident on the surface of a self-traceable grating in Transverse Magnetic (TM) polarization and the incident angle changes within an effective range. The experimental results are consistent with the trend of theoretical calculation results. Full article
(This article belongs to the Special Issue Optical Precision Manufacturing and Testing: Technologies and Trends)
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