Takabayashi, S.; Kotani, S.; Flores-Estrada, J.; Spears, E.; Padilla, J.E.; Godwin, L.C.; Graugnard, E.; Kuang, W.; Sills, S.; Hughes, W.L.
Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami. Int. J. Mol. Sci. 2018, 19, 2513.
https://doi.org/10.3390/ijms19092513
AMA Style
Takabayashi S, Kotani S, Flores-Estrada J, Spears E, Padilla JE, Godwin LC, Graugnard E, Kuang W, Sills S, Hughes WL.
Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami. International Journal of Molecular Sciences. 2018; 19(9):2513.
https://doi.org/10.3390/ijms19092513
Chicago/Turabian Style
Takabayashi, Sadao, Shohei Kotani, Juan Flores-Estrada, Elijah Spears, Jennifer E. Padilla, Lizandra C. Godwin, Elton Graugnard, Wan Kuang, Scott Sills, and William L. Hughes.
2018. "Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami" International Journal of Molecular Sciences 19, no. 9: 2513.
https://doi.org/10.3390/ijms19092513
APA Style
Takabayashi, S., Kotani, S., Flores-Estrada, J., Spears, E., Padilla, J. E., Godwin, L. C., Graugnard, E., Kuang, W., Sills, S., & Hughes, W. L.
(2018). Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami. International Journal of Molecular Sciences, 19(9), 2513.
https://doi.org/10.3390/ijms19092513